Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Flatness measuring device and using method thereof

A measuring device and flatness technology, applied in the direction of measuring devices, optical devices, instruments, etc., can solve the problems of difficulty in measuring the flatness of the structure to be measured, and achieve the effects of simple structure, reduction of high-altitude operations, and safety guarantee

Pending Publication Date: 2020-05-12
中建八局轨道交通建设有限公司
View PDF0 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to overcome the defects of the prior art, provide a flatness measuring device and its use method, solve the problem of difficulty in measuring the flatness of the structure to be measured, ensure the measurement accuracy, ensure the construction quality, and reduce the Potential safety hazards ensure the safety of measuring personnel, and the measuring device has a simple structure and is easy to implement

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Flatness measuring device and using method thereof
  • Flatness measuring device and using method thereof
  • Flatness measuring device and using method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0034] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.

[0035] refer to figure 1 , the present invention provides a flatness measuring device and its use method. The main ruler is adjusted to the level through the leveling bubble and the adjusting member. The structure to be measured can be used to reduce the high-altitude operations of the surveyors. After the main ruler is leveled, the laser range finder can be used to directly emit laser light to the structure to be measured, and the laser range finder can be moved along the main ruler to obtain several groups of main ruler and the target structure. The distance between the measured structures, and the flatness of the structure to be measured can be obtained after comparison, which solves the problem of difficulty in measuring the flatness of the structure to be measured, can ensure measurement accuracy, and ensure construction quality. In additi...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a flatness measuring device and a using method thereof. The flatness measuring device comprises a main ruler and a laser range finder, wherein a horizontal bubble is arrangedon the top face of the main ruler, a telescopic adjusting piece is arranged on the bottom face of the main ruler, the length of the adjusting piece is correspondingly adjusted according to the horizontal bubble, and the main ruler is made to be horizontal; the laser range finder is mounted on the top surface of the main ruler and can be moved and adjusted in the length direction of the main ruler,the laser range finder is moved along the main ruler and emits laser to a to-be-measured structure to measure the distance between a multiple sets of main rulers and the to-be-measured structure, andtherefore the flatness of the to-be-measured structure is obtained through comparison. Thus, the problem that the flatness of the to-be-measured structure is difficult to measure is effectively solved, the measurement precision and the construction quality can be ensured, in addition, the potential safety hazard is reduced, the safety of measurement personnel is ensured, and the measurement device is simple in structure and easy to realize.

Description

technical field [0001] The invention relates to the field of building construction, in particular to a flatness measuring device and a using method thereof. Background technique [0002] Flatness is an important index for testing the construction quality of concrete structures. It refers to the difference between the highest point and the lowest point between the surface to be tested and the reference plane. Stick the ruler close to the surface of the concrete structure to be tested, and then use the feeler gauge to measure the size of the gap between the ruler and the surface of the concrete structure, and use this to judge the flatness of the surface of the concrete structure. [0003] When using the above method for measurement, the actual implementation is relatively difficult, and the measurement must be carried out with a feeler gauge and a ruler. When the position of the concrete structure is high, such as a floor, it is limited by the height of the measurement person...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/30
CPCG01B11/30
Inventor 钱翰飞郝亚军任晓敏王思远龚彦兮
Owner 中建八局轨道交通建设有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com