Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A Subthreshold Bandgap Voltage Reference Based on Substrate Bias Control

A technology of reference voltage and sub-threshold current, applied in the direction of regulating electrical variables, control/regulating systems, instruments, etc., can solve the problems of narrow temperature range and limited, and achieve the effect of widening the linear range, low power consumption, and low voltage

Active Publication Date: 2021-03-26
UNIV OF ELECTRONICS SCI & TECH OF CHINA
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a subthreshold bandgap reference based on substrate bias regulation for the problem that the existing low-voltage bandgap reference voltage source based on subthreshold technology has a narrow temperature range, especially at low temperatures. Voltage source, which not only meets the basic requirements of low voltage and low power consumption under the sub-threshold, but also can work effectively in a wide temperature range

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A Subthreshold Bandgap Voltage Reference Based on Substrate Bias Control
  • A Subthreshold Bandgap Voltage Reference Based on Substrate Bias Control

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0012] The present invention will be described in further detail below in conjunction with the accompanying drawings and embodiments.

[0013] This embodiment provides a subthreshold bandgap reference voltage source based on substrate bias regulation, which is used to realize the subthreshold bandgap reference voltage source with low voltage and low power consumption under the TSMC180nm process and is applicable to a wide temperature range. Its circuit structure like figure 1 As shown, it includes the following parts: a sub-threshold current source, a PMOS transistor M connected by the gate and the source, and the substrate and the drain 6 Composition; PTAT generation circuit, composed of diode-connected PMOS tube M 7 Composition; CTAT generating circuit, composed of diode D 1 Composition; feedback circuit, composed of NMOS tube M 5 Composition; power supply rejection ratio enhancement module, composed of capacitor C c Composition; the reference voltage is implemented in ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention belongs to the technical field of analog integrated circuits, and specifically relates to a subthreshold bandgap reference voltage source based on substrate bias regulation, which is used to solve the problem of narrow temperature range and low temperature range of the existing low voltage bandgap reference voltage source based on subthreshold technology. Especially at low temperatures the problem is severely limited. The invention includes: a sub-threshold current source, a PTAT generating circuit, a CTAT generating circuit, a feedback circuit and a power supply rejection ratio enhancement module, wherein the substrate of the PMOS transistor constituting the PTAT generating circuit is connected to its drain, which greatly reduces the Substrate current, so that Kirchhoff's current law at low temperature can still be solved by PTAT voltage, thus greatly expanding the working temperature range of the reference voltage source; at the same time, using the diode D 1 The CTAT generating circuit formed ensures that the CTAT voltage is not distorted at low temperatures, and further ensures the low temperature adaptability of the reference voltage source of the present invention; and adopts a capacitor C c The constituted power supply rejection ratio enhancement module effectively improves the power supply rejection ratio of the voltage source.

Description

technical field [0001] The invention belongs to the technical field of analog integrated circuits, and relates to a bandgap reference voltage source structure, in particular to a subthreshold bandgap reference voltage source with low voltage and low power consumption based on substrate bias regulation and applied to a wide temperature range. Background technique [0002] Bandgap reference voltage sources are widely used in various integrated circuit modules such as AD / DA, LDO, PLL, etc., and play a basic but key role; with the popularity of extremely low-power integrated circuit design and process With the advancement of medical electronics, Internet of Things and other fields, low-power reference voltage sources working at low voltages are required as a strong support for circuits. [0003] At present, the most widely used is the subthreshold-based bandgap reference voltage source technology, which uses the characteristics of MOSFET with extremely low drain-source current i...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G05F1/56
CPCG05F1/561
Inventor 王政赵琦伟谢倩李云昊庄哲瀚
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products