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Measurement Systems and Methods

A measurement system and processing system technology, applied in the field of measurement, can solve problems such as height distribution errors, and achieve the effect of compact structure

Active Publication Date: 2021-08-31
SKYVERSE TECH CO LTD
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  • Description
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Problems solved by technology

However, due to the movement error of the measuring device, the vibration of the measuring device, the vibration of the environment and other factors, the preset phase shift is not the same as the actual phase shift introduced to the reflected beam. This phase shift error will lead to the measured height distribution with a certain error

Method used

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  • Measurement Systems and Methods
  • Measurement Systems and Methods
  • Measurement Systems and Methods

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Embodiment Construction

[0038] Various exemplary embodiments of the present disclosure will now be described in detail with reference to the accompanying drawings. The description of the exemplary embodiments is illustrative only, and in no way restricts the disclosure, its application or uses. The present disclosure can be implemented in many different forms and is not limited to the embodiments described here. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the disclosure to those skilled in the art. It should be noted that relative arrangements of parts and steps, compositions of materials, numerical expressions and numerical values ​​set forth in these embodiments should be interpreted as illustrative only and not as limiting, unless specifically stated otherwise.

[0039] "First", "second" and similar words used in the present disclosure do not indicate any order, quantity or importance, but are only used to distin...

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Abstract

The present disclosure provides a measurement system and method, which relate to the field of measurement technology. The measurement system includes: a light source for generating a detection beam; an objective lens configured to irradiate the detection beam to a measured area of ​​a measured object, Obtain the light beam to be processed according to the reflected light beam from the measured area; the beam splitter is configured to split the light beam to be processed to obtain a first light beam and a second light beam; an imaging device is configured to obtain a first light beam and a second light beam according to the first light beam A light beam obtains a detection image; the light intensity detection device is configured to obtain the corresponding intensity of light of a preset wavelength according to the second light beam; the mobile device is configured to make the objective lens relative to the optical axis at different times The measured object moves; the processing system is configured to determine the height information of the measured area according to the intensity corresponding to the light of the preset wavelength at different times and the detection images at different times.

Description

technical field [0001] The present disclosure relates to the technical field of measurement, and in particular, to a measurement system and method. Background technique [0002] In the field of integrated circuit manufacturing, in order to improve the product yield, it is necessary to measure the three-dimensional topography of the wafer to check whether the wafer manufacturing process meets the standards. The three-dimensional topography measurement method based on white light interference technology is widely used in the field of integrated circuit inspection due to its non-contact, fast and high-precision characteristics. [0003] White light interference technology uses white light with a short coherence length as the light source, and the surface topography of the measured object can be located by the peak value of the interference signal intensity. The white light phase shift interferometry technology integrates the phase shift of the reflected beam reflected by the m...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/24
CPCG01B11/24
Inventor 陈鲁杨乐马砚忠张威李小辉
Owner SKYVERSE TECH CO LTD
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