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Metrology apparatus, lithography system and method for measuring structures

A technology for measuring equipment and optical systems, applied in measuring devices, optomechanical equipment, microlithography exposure equipment, etc., can solve problems such as difficulty in obtaining sensitivity

Active Publication Date: 2022-01-21
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, it is difficult to obtain sufficient sensitivity in these measurements, especially if the layer separation is not very small

Method used

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  • Metrology apparatus, lithography system and method for measuring structures
  • Metrology apparatus, lithography system and method for measuring structures
  • Metrology apparatus, lithography system and method for measuring structures

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Embodiment Construction

[0029] This specification discloses one or more embodiments of the features of the present invention. The disclosed embodiments will exemplify the invention. The scope of the invention is not limited to the disclosed embodiments. The invention is defined by the appended claims.

[0030] The described embodiments may include specific features, structures, or properties, including specific features, structures, or properties, such as "One Embodiment", Example, Example Embodiment, and the like. Examples may not include the specific features, structures, or characteristics. In addition, these phrases do not necessarily refer to the same embodiment. Additionally, when specific features, structures, or properties are described in connection with embodiments, it is understood that such features, structures, or characteristics are within the scope of the scope of those skilled in the art, whether or not they are explicitly described.

[0031] However, before describing these embodiments i...

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Abstract

A metrology apparatus is disclosed comprising an optical system for focusing radiation onto the structure and directing reflected radiation from the structure to a detection system, the optical system being configured to apply a plurality of different shifts of optical properties to radiation before and / or after reflection from the structure such that, relative to reflected radiation derived from a second point of the pupil plane field distribution, a corresponding plurality of Different offsets are provided to the reflected radiation derived from the first point of the pupil plane field distribution; the detection system detects the difference between the reflected radiation derived from the first point of the pupil plane field distribution and the A corresponding plurality of radiation intensities resulting from interference between reflected radiation derived from said second point of said pupil plane field distribution, each radiation intensity corresponding to a different one of said plurality of different offsets .

Description

[0001] Cross-reference related application [0002] The present application claims priority to European Application 17196670.8 submitted on October 16, 2017, and all of the European applications are incorporated herein by reference. Technical field [0003] The present invention relates to a measuring apparatus for measuring a structure formed on a substrate from a photolithography, a photolithography system, and a method of measurement of a structure formed on a substrate from a photolithography process. Background technique [0004] The lithographic apparatus is a machine that applies the desired pattern to the substrate (usually applied to the target portion of the substrate). Light engraving devices can be used, for example, in the manufacturing of integrated circuits (IC). In that case, the pattern forming apparatus (alternatively referred to as a mask or mask version) can be used to generate a circuit pattern to be formed on the single layer of the IC. This pattern can be tr...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70633G03F7/70625G01B9/02083G01B9/0209
Inventor 乔安科·拉文斯卑尔根D·阿克布卢特N·潘迪廉晋
Owner ASML NETHERLANDS BV
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