Synthesis method and application of patterned silicon dioxide nanostructure

A silicon dioxide and nanostructure technology, applied in the direction of silicon dioxide, silicon oxide, nanotechnology, etc., can solve the problems of limiting the complexity of the silicon dioxide nanostructure, limiting the accuracy of the silicon dioxide nanostructure, etc., to achieve accurate Positioned growth, broad application prospects, selective and efficient effect

Active Publication Date: 2020-06-19
THE NAT CENT FOR NANOSCI & TECH NCNST OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there are still many unsolved problems in previous work
For example, in the process of forming a DNA-silica composite structure using DNA double strands as a template, the assembly needs to grow to the micron level to show a specific controllable morphology, which undoubtedly limits the accuracy of the silica nanostructure.
As another example, in the process of growing silica nanostructures using DNA origami as a template, the silica precursor is non-selectively adsorbed on the surface of the DNA origami structure, so that the formed silica nanostructure completely replicates the DNA origami structure, Also limits the precision of the silica nanostructures and limits the complexity of the patterned silica nanostructures

Method used

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  • Synthesis method and application of patterned silicon dioxide nanostructure
  • Synthesis method and application of patterned silicon dioxide nanostructure
  • Synthesis method and application of patterned silicon dioxide nanostructure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0067] (1) Assembly of triangular DNA origami structures with extended strands

[0068] Mix DNA template strand, folding helper strand, and folding helper strand with extension strand at a molar ratio of 1:10:10 in 1×TAE / Mg 2+ Anneal in buffer (pH=8.0), the annealing condition is from 95°C to 25°C, every 5°C is a gradient, and each gradient stays for 5min;

[0069] After annealing is complete, add the DNA origami structure to a 100kDa spin column and add 1×TAE / Mg 2+ Buffer (pH=8.0), centrifuged to remove excess short-chain DNA;

[0070] (2) Hybridization of the complementary strand with the extended strand of the triangular DNA origami structure

[0071] The purified DNA origami structure was mixed with the complementary strand at a molar ratio of 1:360, and mixed in 1×TAE / Mg 2+ Annealing was carried out under buffer (pH=8.0) condition, the annealing condition was from 45°C to 25°C, every 5°C was a gradient, each gradient was kept for 5min, and 6 cycles were performed;

[...

Embodiment 2

[0077] (1) Assembly of triangular DNA origami structures with extended strands

[0078]The DNA template strand, the auxiliary folding strand and the auxiliary folding strand with the extension strand were mixed in a molar ratio of 1:10:10 in 1×TAE / Mg 2+ Annealing in buffer (pH=8.0), the annealing conditions are from 95°C to 25°C, each 5°C is a gradient, and each gradient stays for 5 minutes;

[0079] After annealing, the DNA origami structure was added to a 100kDa spin column with 1×TAE / Mg 2+ Buffer (pH=8.0), centrifuged to remove excess short-stranded DNA;

[0080] (2) Hybridization of complementary strands and extended strands of triangular DNA origami structures

[0081] The purified DNA origami structure was mixed with complementary strands at a molar ratio of 1:540 and mixed in 1×TAE / Mg 2+ Annealing was carried out under the condition of buffer solution (pH=8.0), the annealing conditions were from 45°C to 25°C, each 5°C was a gradient, and each gradient was held for 5 ...

Embodiment 3

[0087] (1) Assembly of a triangular DNA origami structure with extended strands

[0088] The DNA template strand, the auxiliary folding strand and the auxiliary folding strand with the extension strand were mixed in a molar ratio of 1:10:10 in 1×TAE / Mg 2+ Annealing in buffer (pH=8.0), the annealing conditions are from 95°C to 25°C, each 5°C is a gradient, and each gradient stays for 5 minutes;

[0089] After annealing, the DNA origami structure was added to a 100kDa spin column with 1×TAE / Mg 2+ Buffer (pH=8.0), centrifuged to remove excess short-stranded DNA;

[0090] (2) Hybridization of complementary strands and extended strands of triangular DNA origami structures

[0091] The purified DNA origami structure was mixed with complementary strands at a molar ratio of 1:720 and mixed in 1×TAE / Mg 2+ Annealing was carried out under the condition of buffer solution (pH=8.0), the annealing conditions were from 45°C to 25°C, each 5°C was a gradient, and each gradient was held for ...

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Abstract

The invention provides a synthesis method and application of a patterned silicon dioxide nano-structure, and the method comprises the following steps: adding a silane reagent into a DNA origami structure with an extension chain, and adsorbing the silane reagent onto the extension chain of the DNA origami structure through electrostatic interaction to obtain the patterned silicon dioxide nano-structure. According to the invention, the addressability of the DNA origami structure is utilized, DNA single-stranded or double-stranded arrays extend from preset sites on the surface of the DNA origamistructure, the silane reagent is hydrolyzed under an alkaline condition to form electropositive silicon dioxide nanoparticles, and the electropositive silicon dioxide nanoparticles are adsorbed on anelectronegative extension chain of the DNA origami structure through electrostatic interaction, so that the fixation of the silicon dioxide nanoparticles on a preset site of the DNA origami structureis realized, and the patterned silicon dioxide nanostructure is prepared.

Description

technical field [0001] The invention belongs to the technical field of surface chemical synthesis, and belongs to the technical field of nanostructure processing, and relates to a method for synthesizing patterned silicon dioxide nanostructures and applications thereof. Background technique [0002] Silica, as an important inorganic non-metallic material, exists in nature and living bodies in a crystalline or amorphous state. Silica nanostructures have a wide range of applications in nanoelectronics, nanobiology, and drug delivery. The synthesis methods mainly include top-down and bottom-up. The top-down processing methods mainly include ultraviolet lithography and electron beam exposure. Although such methods are widely used in industrial fields, they have problems such as expensive equipment and harsh working conditions, which limit their application in silica nanometers. Popularization and application in the process of microfabrication of structures. The opposite bottom...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/18B82Y30/00B82Y40/00
CPCB82Y30/00B82Y40/00C01B33/18C01P2004/04C01P2004/20C01P2004/64
Inventor 丁宝全李娜尚颖旭
Owner THE NAT CENT FOR NANOSCI & TECH NCNST OF CHINA
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