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Synthesis method and application of a patterned silicon dioxide nanostructure

A silicon dioxide and nanostructure technology, applied in the direction of silicon dioxide, silicon oxide, nanotechnology, etc., can solve the problems of limiting the accuracy of silicon dioxide nanostructures, limiting the complexity of silicon dioxide nanostructures, etc., and achieve wide application foreground effect

Active Publication Date: 2021-07-27
THE NAT CENT FOR NANOSCI & TECH NCNST OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there are still many unsolved problems in previous work
For example, in the process of forming a DNA-silica composite structure using DNA double strands as a template, the assembly needs to grow to the micron level to show a specific controllable morphology, which undoubtedly limits the accuracy of the silica nanostructure.
As another example, in the process of growing silica nanostructures using DNA origami as a template, the silica precursor is non-selectively adsorbed on the surface of the DNA origami structure, so that the formed silica nanostructure completely replicates the DNA origami structure, Also limits the precision of the silica nanostructures and limits the complexity of the patterned silica nanostructures

Method used

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  • Synthesis method and application of a patterned silicon dioxide nanostructure
  • Synthesis method and application of a patterned silicon dioxide nanostructure
  • Synthesis method and application of a patterned silicon dioxide nanostructure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0067] (1) Assembly of triangular DNA origami structures with extended strands

[0068] Mix DNA template strand, folding helper strand, and folding helper strand with extension strand at a molar ratio of 1:10:10 in 1×TAE / Mg 2+ Anneal in buffer (pH=8.0), the annealing condition is from 95°C to 25°C, every 5°C is a gradient, and each gradient stays for 5min;

[0069] After the annealing is completed, add the DNA origami structure to a 100kDa spin column and add 1×TAE / Mg 2+ Buffer (pH=8.0), centrifuged to remove excess short-chain DNA;

[0070] (2) Hybridization of the complementary strand with the extended strand of the triangular DNA origami structure

[0071] The purified DNA origami structure was mixed with the complementary strand at a molar ratio of 1:360, and mixed in 1×TAE / Mg 2+ Annealing was carried out under the condition of buffer solution (pH=8.0), the annealing condition was from 45°C to 25°C, every 5°C was a gradient, each gradient was kept for 5min, and 6 cycles...

Embodiment 2

[0077] (1) Assembly of triangular DNA origami structures with extended strands

[0078]Mix DNA template strand, folding helper strand, and folding helper strand with extension strand at a molar ratio of 1:10:10 in 1×TAE / Mg 2+ Anneal in buffer (pH=8.0), the annealing condition is from 95°C to 25°C, every 5°C is a gradient, and each gradient stays for 5min;

[0079] After annealing is complete, add the DNA origami structure to a 100kDa spin column and add 1×TAE / Mg 2+ Buffer (pH=8.0), centrifuged to remove excess short-chain DNA;

[0080] (2) Hybridization of the complementary strand with the extended strand of the triangular DNA origami structure

[0081] The purified DNA origami structure was mixed with the complementary strand at a molar ratio of 1:540, and mixed in 1×TAE / Mg 2+ Annealing was carried out under the condition of buffer solution (pH=8.0), the annealing condition was from 45°C to 25°C, every 5°C was a gradient, each gradient was kept for 5min, and 6 cycles were ...

Embodiment 3

[0087] (1) Assembly of triangular DNA origami structures with extended strands

[0088] Mix DNA template strand, folding helper strand, and folding helper strand with extension strand at a molar ratio of 1:10:10 in 1×TAE / Mg 2+ Anneal in buffer (pH=8.0), the annealing condition is from 95°C to 25°C, every 5°C is a gradient, and each gradient stays for 5min;

[0089] After annealing is complete, add the DNA origami structure to a 100kDa spin column and add 1×TAE / Mg 2+ Buffer (pH=8.0), centrifuged to remove excess short-chain DNA;

[0090] (2) Hybridization of the complementary strand with the extended strand of the triangular DNA origami structure

[0091] The purified DNA origami structure was mixed with the complementary strand at a molar ratio of 1:720, and mixed in 1×TAE / Mg 2+ Annealing was carried out under the condition of buffer solution (pH=8.0), the annealing condition was from 45°C to 25°C, every 5°C was a gradient, each gradient was kept for 5min, and 6 cycles were...

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Abstract

The invention provides a method for synthesizing a patterned silica nanostructure and its application, the method comprising: adding a silane reagent to a DNA origami structure with extended chains, and the silane reagent is adsorbed to the DNA origami structure through electrostatic interaction On the extended chains, patterned silica nanostructures are obtained. The present invention utilizes the addressability of the DNA origami structure to extend a DNA single-strand or double-strand array at the predetermined position on the surface of the DNA origami structure, and the silane reagent is hydrolyzed under alkaline conditions to form electropositive silica nanoparticles. Through electrostatic adsorption on the negatively charged extension chain of the DNA origami structure, the immobilization of silicon dioxide nanoparticles on the preset sites of the DNA origami structure is realized, and a patterned silicon dioxide nanostructure is prepared.

Description

technical field [0001] The invention belongs to the technical field of surface chemical synthesis and the technical field of nanostructure processing, and relates to a method for synthesizing a patterned silicon dioxide nanostructure and its application. Background technique [0002] Silica, as an important inorganic non-metallic material, exists in nature and living organisms in crystalline or amorphous state. Silica nanostructures are widely used in the fields of nanoelectronics, nanobiology, and drug delivery. The synthesis methods mainly include top-down and bottom-up. Top-down processing methods mainly include ultraviolet lithography and electron beam exposure. Although these methods are widely used in industrial fields, they have problems such as expensive equipment costs and harsh working conditions, which limit their application in silica nanometers. Applications in microfabrication of structures. In contrast, the bottom-up processing method solves this problem. i...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B33/18B82Y30/00B82Y40/00
CPCB82Y30/00B82Y40/00C01B33/18C01P2004/04C01P2004/20C01P2004/64
Inventor 丁宝全李娜尚颖旭
Owner THE NAT CENT FOR NANOSCI & TECH NCNST OF CHINA
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