A device and method for reducing the number of pulses required for introducing a femtosecond laser into a structure
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- HUAZHONG UNIV OF SCI & TECH
- Publication Date
- 2021-06-11
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Abstract
Description
Technical field
[0001] The present invention belongs to the field of laser processing, and more particularly to a device and method for reducing the number of pulses required for femtosecond laser introduction structure. Background technique
[0002] In recent years, femtosecond lasers and their applications have been greatly developed and have received more and more attention. Due to its extremely high instantaneous power density, a nonlinear effect such as multi-photonic absorption or multi-photon polymerization can be achieved inside the transparent material after the focus is focused, and the rapid development is obtained in the field of micro-nano manufacturing. Molten Stone is a common material commonly used in femtosecond laser processing, depending on the difference in laser pulse energy, the molten quartz can induce three different types of structural changes. When the pulse energy is low, the refractive index of the processing area increases and can be used to make the ...