Method for preparing optical chiral devices by stacking crystalline nanowire arrays
A technology of nanowire array and silicon nanowire array, which is applied in the field of preparing optical chiral devices by stacking crystalline nanowire arrays, can solve the problems of incomplete research on the mechanism, and achieve good non-toxicity, high transparency, and stable performance. Effect
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[0028] The present invention will be further explained below in conjunction with the accompanying drawings and specific embodiments.
[0029] Such as figure 1 As shown, this embodiment provides a method for preparing optical chiral devices by stacking crystalline nanowire arrays, which specifically includes the following steps:
[0030] 1) Deposit a layer of insulating dielectric layer as a sacrificial layer by PECVD / PVD / CVD on a substrate with a high temperature resistance of 350°C or higher, with a thickness of 600-1μm;
[0031] 2) Define the channel guide pattern of the crystalline nanowire array on the above substrate, and use the inductively coupled plasma (ICP) etching or reactive ion etching (RIE) process to etch the dielectric layer to form the guide of the vertical step side wall The channel, the guide channel generally does not exceed 350nm, and the depth of the guide channel in this embodiment is 150±10nm;
[0032] 3) The guide channel prepared in the above step i...
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