Method used for manufacturing planar magnetic plate and capable of improving metal film making uniformity
A uniformity, metal film technology, applied in the field of photoelectric material preparation, can solve the problems of film thickness uniformity fluctuation and the magnetic field distribution cannot be completely matched, etc., to achieve the effect of stable film thickness uniformity and not easy to fluctuate
Inactive Publication Date: 2020-08-28
XIANYANG CAIHONG OPTOELECTRONICS TECH CO LTD
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Problems solved by technology
[0004] In the prior art, when the magnetron sputtering method is used to improve the uniformity of the metal film, the film thickness uniformity of the metal film is mainly controlled by adjusting the distribution of the anode magnetic blocks to control the uniformity of the electric field. However, due to the influence of the material of each machine’s own mechanism, The magnetic field distribution cannot be completely matched, and the film thickness uniformity of the prepared metal film is less than 15%, and there are large fluctuations in the film thickness uniformity
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Embodiment 1
[0034] In describing the present invention, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " Orientation or position indicated by "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", etc. The relationship is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, therefore It should not be construed as a limitation of the present invention.
[0035] In addition, the terms "first" and "second" are used for descriptive purposes only, and cannot be interpreted as indicating or implying relative importance or implicitly specifying the quantity of indic...
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Abstract
The invention relates to a method used for manufacturing a planar magnetic plate and capable of improving metal film making uniformity. The method includes the steps that a metal film is deposited onthe surface of a substrate; the uniformity distribution of the metal film is measured; and the planar magnetic plate is manufactured according to the uniformity distribution. According to the method,the uniformity distribution of the metal film made through a machine table is calculated by pre-mounting a rectangular magnetic plate, the planar magnetic plate complementary with the uniformity distribution of the metal film is manufactured, and therefore a magnetic plate completely matched with the magnetic field of the machine table is formed. When the planar magnetic plate manufactured with the method is used in cooperation with the machine table, the theoretical value of the film thickness uniformity of the prepared metal film can reach 0, and the film thickness uniformity is stable and not prone to fluctuate.
Description
technical field [0001] The invention belongs to the technical field of photoelectric material preparation, and in particular relates to a method for manufacturing a planar magnetic plate that improves the uniformity of metal film formation. Background technique [0002] Indium Tin Oxide or Tin doped Indium Oxide film is an N-type semiconductor, referred to as metal film. Due to the excellent transparency and conductivity of metal film materials, they have developed rapidly in recent years, especially in thin film transistors (TFTs), flat panel liquid crystal displays (LCDs), transparent electrodes of solar cells and coatings of infrared radiation reflectors, trains and airplanes. It is widely used in glass defrosting, building curtain wall glass, etc. [0003] The thickness uniformity of the metal film directly affects the function of thin-film devices. For example, in the manufacture of large-size, high-contrast display devices, in order to ensure the uniformity of the etc...
Claims
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IPC IPC(8): C23C14/35C23C14/54
CPCC23C14/35C23C14/542
Inventor 赵青青申屠永华王伟
Owner XIANYANG CAIHONG OPTOELECTRONICS TECH CO LTD