74results about How to "Stable Uniformity" patented technology

The invention discloses a PTC (Positive Temperature Coefficient) high polymer heating material for a self-limiting temperature electric tracing band, which is prepared from the following raw materials in percentage by weight: 5 to 9 percent of metallocene polyethylene, 65 to 70 percent of high-density polyethylene, 6 to 10 percent of vinyl copolymer thermoplastic elastomer, 1.5 to 2.5 percent of carbon fibers, 15 to 25 percent of carbon black, 0.25 to 0.35 percent of benzotriazole light stabilizer, 0.10 to 0.20 percent of hindered phenol antioxygen, 0.10 to 0.20 percent of decabromodiphenylethane, 0.10 to 0.20 percent of diisooctyl ortho-phthalate, 0.10 to 0.20 percent of dicumyl peroxide and 0.05 to 0.15 percent of nucleating transparent agent zc-3. According to the invention, the elasticity modulus of the PTC material is improved, the maximum stress and the stress of a breaking point of the PTC material are increased, so that the PTC strength and the stretch resistance performance of the PTC heating material are improved.

The invention discloses one-sided silicon wafer wet etching equipment. The equipment comprises a liquid feeding device (1), an etching chamber (2) and a remaining liquid processing device (3), wherein the liquid feeding device (1) sprays a high-temperature alkaline etching liquid onto a silicon wafer rotating on a vacuum chuck in the etching chamber (2) to carry out reaction rate and surface finish controlled anisotropic wet etching on the silicon wafer; at the same time, the silicon wafer is tightly fit with the vacuum chuck in the etching chamber (2); and the fitting surface is isolated from the etching environment to realize protection of the one-sided silicon wafer. The equipment has the following beneficial effects: one-sided wet etching is carried out by spraying the high-temperature alkaline etching liquid onto the silicon wafer rotating on the vacuum chuck and vacuum is utilized to effectively isolate the side to be protected from the etching environment, thus solving the problem that long-time one-sided protection is difficult to implement on the silicon wafer in the tradition wet etching processes.

The invention discloses a gas carbonitriding automatic control method and device. The device comprises nine devices, namely, a nitriding furnace 1, a PLC, a pressure sensor, a hydrogen probe, a thermocouple, a blade, a fan, a heating and temperature control device and an air exhausting device. After being subjected to degreasing, cleaning and surface treatment, a part is subjected to closed loop feedback control of a vacuum pump, nitrogen, ammonia, ethyl alcohol, temperature and pressure in the furnace, so that the nitrocarburizing of various common nitriding steel such as high-speed steel and stainless steel is achieved. The device is energy-saving and efficient in use, easy to maintain and free of pollution, the product is high in quality performance, the PLC control system is adopted to quickly confirm and control the depth of the white etching layer and the reticular layer of the part to be stable according to the number of corresponding parts and the technological parameters of the material, the uniformity of stainless steel mass production is stable, the ammonia consumption is less, the energy consumption is low, the nitridation time is short, and the efficiency is high.

A semiconductor device manufacturing apparatus according to the present invention comprises a head for holding a semiconductor wafer, a retainer ring for surrounding the outer periphery of the semiconductor wafer held by the head, and a polishing pad for polishing a polished surface of the semiconductor wafer. This apparatus presses the polished surface of the semiconductor wafer against the polishing pad together with the retainer ring to polish the semiconductor wafer. The retainer ring used in the present invention has a surface that is in contact with the polishing pad, which increases a contact area of the retainer ring against the polishing pad in accordance with wear of the retainer ring.

Spray nozzle device comprises a mixing chamber (2) which acts as a diffuser and has a mixing body (1). The mixing chamber is provided with an air inlet (3), a water inlet (4), and a nozzle outlet (5) oriented approximately in alignment with the air inlet through which an air or water mixture exits. The air inlet comprises a region projecting in the mixing chamber, and at least one air outlet hole, which is perpendicular to the longitudinal axis of the mixing chamber. The water enters near the tip through at least one water outlet hole, which is oriented perpendicular to the longitudinal axis.

The invention relates to a uniform transition cotton net transmission device. The device comprises a supporting and fixing iron support, wherein the front end of the supporting and fixing iron support is obliquely provided with a cotton net feeding conveyor belt, the upper side of the cotton net feeding conveyor belt is in horizontal butt joint with a cotton net transition transmission belt, the upper side of one end of the cotton net transition transmission belt is provided with a copper net through cyclic rolling of a plurality of copper net transmission shafts, the lower side of the copper net is horizontal, an electrospinning device spraying submicron fibers upward is arranged below the copper net, and the cotton net feeding conveyor belt, the cotton net transition transmission belt and the copper net transmission shafts are driven to rotate by a first motor, a second motor and a third motor which are located at one side of the supporting and fixing iron support respectively. The uniform transition cotton net transmission device has the advantages that a carding net can maintain uniform and smooth running to directly under the copper net in the transmission process, so that the submicron fibers sprayed by the electrospinning device act on the uniform cotton net, and the derived length and uniformity of the cotton net are increased through a conduction linkage device, so that the subsequent strip forming performance achieves the best effect.

The invention relates to a magnetic suspension automatic preparation apparatus. The apparatus includes a box body, a stirring device, a spraying device, a detection device, a control device, and a display device; the stirring device includes a stirring motor, a connecting rod, and blades; the spraying device includes a vacuum pump, a connection hard pipe, a connection flexible pipe and a sprayinghead; the detection device includes a concentration sensor and a liquid level gauge, wherein the detection head of the concentration sensor extends into the box body, and the liquid level gauge is located in the box body; the control device includes a main controller and a time controller, wherein the main controller is connected with a flow valve and a solenoid valve, and the time controller is connected with the stirring motor so that the stirring motor performs stirring actions according to the control of the time controller; and the display device is connected with the concentration sensorand the liquid level gauge. Compared with a conventional preparation mode, the magnetic suspension automatic preparation apparatus of the invention can save 60% to 70% of working time. Compared witha conventional preparation device, the apparatus of the invention can realize control in key links such as time, water injection quantity, magnetic suspension concentration, discharge quantity and residual liquid quantity and realize automatic operation.

The invention relates to a cathode slurry and a manufacturing method thereof. The cathode slurry comprises, by weight, 100 parts of a cathode activated carbon material, 0.5 to 2 parts of a conductiveagent, 1 to 5 parts of urea, 0.5 to 2 parts of a binder, 1 to 1.5 parts of a thickener and 110 to 125 parts of water. The cathode slurry can be coated on a thinner current collector substrate withoutaffecting coating efficiency so that the weight of the substrate can be reduced and simultaneously the coating efficiency is improved. The slurry and the method can be applied to industrial production.