Ion source electric field structure and ion source device

Abstract

The invention relates to an ion source electric field structure and an ion source device. The ion source electric field structure comprises an anode component disposed in a shell, wherein an isolationmetal layer is disposed between the anode component and the shell, the isolation metal layer is of an annular design corresponding to the anode component and is kept in an insulating state with the anode component and the shell, and the isolation metal layer induces an electric field of a voltage through the anode component, and controls the emission angle of an ion beam emitted by the ion sourcethrough the electric field. According to the technical scheme, the annular isolation metal layer corresponding to the anode component is arranged between the anode component and the shell, and the isolation metal layer is located at a suspension potential, induces an electric field of a voltage through the anode component, and controls the emission angle of an ion beam emitted by the ion source through the electric field; and the electric field structure can effectively control the ion beam emission angle range of the ion source, and improve the concentration effect of ion beams emitted by the ion source.

Description

technical field [0001] The present application relates to the field of ion source technology, in particular to an ion source electric field structure and an ion source device. Background technique [0002] Ion source is an applied science and technology with wide application, many types, many sciences involved, strong technological process and very rapid development. As a very commonly used ion source type, the Hall ion source is mostly used in the field of thin film deposition as a deposition auxiliary component to improve the physical properties of thin films. The Hall ion source is that the anode plasmaizes the process gas under the cooperation of a strong axial magnetic field, and the plasmaized gas passes through the acceleration of the anode to separate the gas ions and form an ion beam. [0003] In a commonly used ion source, its electric field structure is mainly realized by the anode part 10, such as figure 1 as shown, figure 1 It is a schematic diagram of the em...

AI Technical Summary

Problems solved by technology

[0003] In a commonly used ion source, its electric field structure is mainly realized by the anode part 10, such as figure 1 as shown, figure 1 It is a schematic diagram of the emission angle of a commonly used ion source. The anode part 10 accelerates the ion beam through the action of an electric field. From the figure, it can be found that the ion source itself has a large divergence angle, which can generally reach more than 90°. The excessive divergence angle makes the ion beam The distribution of the beam current is not concentrated. When the target object is a small area, if the emission angle range required by the ion source is too large, the ion beam will be too scattered and the density will be low, resulting in a low efficiency of the ion beam.

Images