Upper race lubricating method for rapid thermal processing (RTP) machine station

Abstract

The invention discloses an upper race lubricating method for a rapid thermal processing (RTP) machine station. The upper race lubricating method for the RTP machine station is characterized in that awafer edge ring of the machine station is supported by a support structure consisting of an upper race, a ball bearing, spacers and a lower race; the ball bearing and the spacers are positioned between the upper race and the lower race; and a lubricating agent is evenly smeared in a groove of the upper race of the wafer edge ring support structure. According to the method, the lubricating agent isevenly smeared in the groove, which is contact with balls of the ball bearing, of the upper race, so that contacts between the upper race and the balls can be fully lubricated by the lubricating agent with the larger contact area; the lubricating state between the upper race and the balls is improved; the wafer edge ring rotates more smoothly and evenly under the support of the upper race; and the risk of scratching of the back side of a wafer due to uneven rotation of the wafer edge ring is lowered.

Description

technical field [0001] The invention relates to the field of semiconductor integrated circuit manufacturing, in particular to a method for lubricating a top ring on a ball of an RTP machine used in an RTP process. Background technique [0002] In the process of wafer manufacturing, high-temperature processes are often used, such as film deposition, or high-temperature thermal annealing after ion implantation, etc. There is a problem of redistribution of impurities after ion implantation at high temperature. For small-scale devices, this redistribution is often very undesirable, so in recent years emphasis has been placed on low-temperature processes that minimize diffusion. However, some processes, such as post-implantation annealing, are not as effective at low temperatures as at high temperatures, and if high temperatures are not reached, certain types of implant damage cannot be removed by annealing. In addition, the annealing temperature required to fully activate cert...

AI Technical Summary

Problems solved by technology

In actual operation, since the gap for applying lubricant to the bottom ring of the ball is narrow, it is not easy to apply it evenly, and the contact surface with the ball of the supported ball bearing is small, so the lubrication effect is not ideal, which makes the edge ring rotate unevenly, and finally Cause scratches on the back of the product

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