Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Automatic polycrystalline silicon washing device

An automatic cleaning, polysilicon technology, applied in the direction of cleaning method using liquid, dry gas arrangement, cleaning method and utensils, etc., can solve the problems of high labor intensity, low degree of automation of cleaning equipment, poor cleaning effect, etc.

Pending Publication Date: 2020-10-23
HAIYAN DESHENG CHEM EQUIP
View PDF0 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When molten elemental silicon is solidified under supercooled conditions, silicon atoms are arranged in the form of diamond lattices to form many crystal nuclei. If these crystal nuclei grow into crystal grains with different crystal plane orientations, these crystal grains combine to crystallize into polycrystalline silicon. In the production process of polysilicon, the stains and dust attached to the surface of polysilicon need to be cleaned to improve the purity of polysilicon and the quality of finished products. The existing cleaning equipment has a low degree of automation, high manual labor intensity, poor cleaning effect, and troublesome cleaning process. strenuous

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Automatic polycrystalline silicon washing device
  • Automatic polycrystalline silicon washing device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0014] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below with reference to the accompanying drawings and embodiments. However, it should be understood that the specific embodiments described here are only used to explain the present invention, and are not intended to limit the scope of the present invention. Also, in the following description, descriptions of well-known structures and techniques are omitted to avoid unnecessarily obscuring the concept of the present invention.

[0015] refer to figure 1 , figure 2 , an automatic cleaning device for polysilicon in the present invention, comprising a cleaning frame 1, a drying frame 2, a cleaning machine cover 3, a drying machine cover 4, a conveyor belt 5, a conveyor belt supporting side plate 6, several cleaning hanging baskets 7, cleaning Hanging basket handling device 8, several drying fans 9, one end of the clea...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses an automatic polycrystalline silicon washing device which comprises a washing rack, a drying rack, a washing hood, a drying hood, a conveyor belt, a conveyor belt support sideplate, a plurality of washing baskets, a washing basket carrying device and a plurality of drying fans; the drying rack is connected with one end of the washing rack; the drying hood is transversely arranged at the upper end of the drying rack; the washing hood is transversely arranged at the upper end of the washing rack; the washing hood communicates with the drying hood; and the end, far away from the drying rack, of the washing rack extends out of the washing hood to be provided with a feeding platform. According to the automatic polycrystalline silicon washing device, the washing basket carrying device is cooperated with the washing baskets, a plurality of washing grooves and the conveyor belt to realize automatic feeding, automatic washing and automatic drying, improve the polycrystalline silicon washing efficiency and lower the manual labor intensity; and purified water is filled in the washing grooves, and the washing quality is improved through ultrasonic washing.

Description

【Technical field】 [0001] The invention relates to the technical field of polysilicon production equipment, in particular to the technical field of polysilicon cleaning devices. 【Background technique】 [0002] Polysilicon is a form of elemental silicon. When molten elemental silicon is solidified under supercooled conditions, silicon atoms are arranged in the form of diamond lattices to form many crystal nuclei. If these crystal nuclei grow into crystal grains with different crystal plane orientations, these crystal grains combine to crystallize into polycrystalline silicon. In the production process of polysilicon, the stains and dust attached to the surface of polysilicon need to be cleaned to improve the purity of polysilicon and the quality of finished products. The existing cleaning equipment has a low degree of automation, high manual labor intensity, poor cleaning effect, and troublesome cleaning process. strenuous. 【Content of invention】 [0003] The purpose of th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/02B08B3/10B08B3/12B08B13/00F26B21/00
CPCB08B3/022B08B3/045B08B3/041B08B3/123B08B3/10B08B13/00F26B21/00
Inventor 冯沈全骆铁飞孔苏林
Owner HAIYAN DESHENG CHEM EQUIP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com