Sputtering cathode gas distribution system for optical film

Abstract

The invention relates to the technical field of thin film preparation, in particular to a sputtering cathode gas distribution system for an optical thin film. The system comprises at least one sectionof double-sleeve pipeline, the double-sleeve pipeline is connected with a gas mass flow controller, and the mass and the flow of process gas conveyed by the double-sleeve pipeline are controlled by the gas mass flow controller; and the double-sleeve pipeline is composed of an inner pipe and an outer pipe arranged on the periphery of the inner pipe in a sleeving manner, and air outlet holes are formed in the inner pipe and the outer pipe respectively. The system has the advantages that (1) the process gas is distributed in a multi-section manner and is independently controlled by the gas massflow controller, and the flow of the gas entering a cathode unit cavity can be adjusted in a sectional manner according to process requirements; (2) due to the use of double sleeves, the pressure difference of each air outlet hole distributed in the single-section outer pipe can be effectively reduced; (3), an airflow transmission flow guide baffle can reflect the gas for multiple times and guidethe gas to flow out towards a target surface in a directional manner; and (4) a diffusion flow guide plate can control the direction of guiding the gas into a cavity.

Description

technical field [0001] The invention relates to the technical field of thin film preparation, in particular to a sputtering cathode gas distribution system for optical thin films. Background technique [0002] With the increasing use of magnetron cathodes in the production of optical films, different optical film systems have higher and higher requirements for the optical constants of the produced films. The stable operation of magnetron sputtering cathodes requires a stable power supply In addition to the system, a good process gas distribution system is also required to ensure. [0003] During the production process of the optical film, the rotating operation of the turntable or the conveying and traveling of the substrate may easily cause the turbulence of the process airflow inside the process chamber. The turbulent airflow will cause the material sputtered from the target surface to attach to the target surface of other stations again, which will cause mutual pollution...

AI Technical Summary

Problems solved by technology

[0003] During the production of optical thin films, the rotating operation of the turntable or the transport of the substrate may easily cause the turbulence of the process airflow inside the process chamber

The turbulent air flow will cause the material sputtered from the target surface to attach to the target surface of other stations again, which will cause mutual pollution of the target surface

The turbulent flow of active gas will lead to changes in the gas atmosphere of other target positions

This situation will cause the optical constants of the production film to be unstable, the thickness of the film is difficult to control, and sometimes even cause cathode poisoning, resulting in a gradual change in the working state of the cathode.

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