Displacement measuring device and method based on electromagnetic induction transparent atomic grating

A technology of electromagnetically induced transparency and displacement measurement, applied in measurement devices, optical devices, instruments, etc., can solve problems such as cost increase, repeated adjustment system complexity, measurement error, etc., achieve high displacement measurement accuracy, and reduce production process requirements. , the effect of low integration difficulty

Active Publication Date: 2020-11-10
SHANXI UNIV
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Problems solved by technology

First of all, there are inevitably defects in the traditional grating production, which will lead to measurement errors; moreover, there is a singleness in the use of physical gratings, a single-made grating can only be used in one application scenario, and changes in measurement requirements can only be made through replacement, which will increase the cost and the complexity of the repeated adjustment system

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  • Displacement measuring device and method based on electromagnetic induction transparent atomic grating
  • Displacement measuring device and method based on electromagnetic induction transparent atomic grating
  • Displacement measuring device and method based on electromagnetic induction transparent atomic grating

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Embodiment Construction

[0039] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are part of the embodiments of the present invention, rather than All the embodiments; based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts all belong to the protection scope of the present invention.

[0040] like figure 1 As shown, the embodiment of the present invention provides a displacement measurement device based on an electromagnetically induced transparent atomic grating, including a coupling laser source 1, a detection laser source 2, an offset frequency-locked optical path 3, an electromagnetically induced frequency-locked optical path 4, and a reference interference optical path 5. Measure th...

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Abstract

The invention belongs to the technical field of precision displacement measurement, and provides a displacement measurement system based on an electromagnetic induction transparent atomic grating, which comprises a coupling laser source, a detection laser source, an offset frequency locking optical path, an electromagnetic induction frequency locking optical path, a reference interference opticalpath, a measurement interference optical path and a photoelectric detection optical path, a corresponding standing wave field structure is built through an interference light path, the refractive index in an atomic medium is periodically modified under an electromagnetic induction transparent mechanism, the atomic grating with the adjustable grating distance is built, detection is carried out through four double-channel photoelectric detectors, displacement measurement is carried out through the atomic grating, and the measurement precision is improved. Moreover, the limitation that the grating distance of the solid grating cannot be adjusted is broken through, the grating distance can be reasonably set according to different displacement degrees of the to-be-measured object, and the grating displacement measurement system with the adjustable minimum displacement resolution is achieved, so that the grating displacement measurement system meets the displacement measurement requirementsin various environments.

Description

technical field [0001] The invention belongs to the technical field of precision displacement measurement, and in particular relates to a displacement measurement device and method based on an electromagnetically induced transparent atomic grating. Background technique [0002] The grating displacement measurement technology first used the Moiré fringe phenomenon formed by the grating overlap to realize the precise measurement of displacement, but the grating based on this measurement principle is only suitable for occasions that do not require high precision. Later, with the development of grating displacement measurement technology based on the principle of interferometry, the accuracy of grating displacement measurement has been improved to the nanometer level, and it has been applied in cutting-edge equipment such as lithography machines. However, the traditional grating displacement measurement technology is mainly based on the physical grating. The grating manufacturin...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/02
CPCG01B11/02
Inventor 元晋鹏汪丽蓉董世超
Owner SHANXI UNIV
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