Device and method for broadening high-energy excimer laser pulses

An excimer laser and pulse broadening technology, applied in lasers, phonon exciters, laser parts, etc., can solve the problem of limiting the use effect, error and control difficulty of pulse broadening devices, affecting the exposure performance and product quality of lithography machines, etc. question

Pending Publication Date: 2020-11-20
成都技致光电科技有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The disadvantage of the above-mentioned patent is that it does not consider how to ensure that the beam characteristics do not change after the beam passes through the pulse stretching device. Errors and control difficulties in subsequent processing and applications affect the exposure performance and product quality of the lithography machine, and limit the actual use of the pulse stretching device

Method used

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  • Device and method for broadening high-energy excimer laser pulses
  • Device and method for broadening high-energy excimer laser pulses
  • Device and method for broadening high-energy excimer laser pulses

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Experimental program
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Effect test

Embodiment 1

[0031] like figure 1As shown, the excimer laser pulse stretching device based on two beam-splitting elements and eight spherical mirrors to form an optical delay cavity in this embodiment is composed of the first beam-splitting element BS1, the second beam-splitting element BS2 (the first The first beam-splitting element BS1 and the second beam-splitting element BS2 are both 45-degree beam-splitting elements), spherical mirror M1, spherical mirror M2, spherical mirror M3, spherical mirror M4, spherical mirror M5, spherical mirror M6, spherical mirror M7, spherical mirror M8.

[0032] The input beam is first split into two beams by the first beam splitting element BS1, namely the transmitted beam and the reflected beam. The transmitted beam is directly incident on the second beam splitting element BS2 for further splitting, and the reflected beam is also incident on the second beam splitting element BS2 for further splitting after being optically delayed by the spherical mirro...

Embodiment 2

[0036] In order to further improve the pulse stretching ratio, the excimer laser pulse stretching device based on two beam splitting elements and eight spherical mirrors used in the present invention to form an optical delay cavity and the device based on a single beam splitting element and four spherical mirrors to form an optical delay cavity Excimer laser pulse stretching devices are used in series, such as figure 2 As shown, the output beam through the optical delay cavity is consistent with the input beam directly passing through the beam splitting element BS1, the beam splitting element BS2, and the output beam of the beam splitting element BS3 in terms of spot size, beam divergence angle, beam drift and other characteristic parameters.

[0037] The radius of curvature of the spherical reflector in the excimer laser pulse stretching device used in this embodiment is related to the length of the optical delay cavity. When optimizing the radius of curvature of the spherica...

Embodiment 3

[0039] In order to further illustrate the necessity of the number of mirrors in the optical delay cavity being 8, image 3 In order to adopt an excimer laser pulse stretching device based on two beam splitting elements and four spherical mirrors to form an optical delay cavity, a part of the beam in the input beam is reflected by the beam splitting element BS4, spherical mirror M13, spherical mirror M14 reflection and beam splitting Component BS5 reflection, after an even number of (four) mirror reflections and an odd number of (one) imaging, the output beam formed is an inverted image of the input beam, resulting in the final output beam including two beams of the normal image and the inverted image. When the pointing of the input beam drifts, the pointing drift of the output beam will increase exponentially, resulting in poor pointing stability of the input beam after passing through the excimer laser pulse stretching device.

[0040] same, Figure 4 In order to adopt an ex...

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PUM

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Abstract

The invention discloses a device and a method for broadening a high-energy excimer laser pulse. When the number of the spherical reflectors forming the optical delay cavity is determined to be eight or sixty, the pulse broadening device can control the beam characteristics of the output beam while effectively broadening the excimer laser pulse width, ensures that the characteristic parameters of the output beam after the beam is broadened by the pulse broadening device are not changed by optimizing the curvature radius of a reflector in the pulse broadening device, and has actual engineering application value. The pulse broadening device effectively broadens the excimer laser pulse width, controls the light beam characteristics of the output light beam, ensures that the light beam characteristic parameters of the input light beam and the output light beam are not changed by optimizing the curvature radius of the reflector, and has practical engineering application value.

Description

technical field [0001] The invention relates to the technical field of adjusting and controlling output parameters of excimer lasers, in particular to a device and method for high-energy excimer laser pulse stretching. Background technique [0002] The advancement of lithography technology has promoted the great development of large-scale integrated circuit manufacturing technology. With the continuous improvement of lithography technology nodes, the wavelength of exposure light source used by lithography machines has changed from 436nm (G line), 365nm (I line), to 248nm (KrF excimer laser), 193nm (ArF excimer laser), and then to the extreme ultraviolet wavelength (EUV) of 10-14nm, the exposure light source of the widely used 45nm to 10 / 7nm technology node lithography machine is 193nm ArF excimer laser. In order to improve the production efficiency of lithography machines, the output energy of excimer lasers for lithography is constantly increasing, but at the same time it ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01S3/00H01S3/11
CPCH01S3/0057H01S3/11
Inventor 李斌成
Owner 成都技致光电科技有限公司
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