Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Double-station polishing machine

A dual-station, polishing machine technology, applied in the field of polishing machines, can solve problems such as product inconsistency, unbalanced polishing, and different polishing forces, and achieve consistent workpiece processing, balanced polishing forces, and consistent force effects

Pending Publication Date: 2020-12-08
湖南宇环精密制造有限公司
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the accumulation of assembly errors and the thickness tolerance of consumables, the polishing strength of the workpiece parts on the two tooling plates is not the same, so the polishing on both sides is unbalanced, resulting in inconsistent products

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Double-station polishing machine
  • Double-station polishing machine
  • Double-station polishing machine

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0026] The present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0027] Figure 1 to Figure 4 An embodiment of the double-station polishing machine of the present invention is shown, including a frame 1, a traverse drive group 2, a lift drive group 3, a double-station pressure balance device 4 and a polishing group 5, and the double-station pressure balance device 4 includes a fixed machine base 41, an elevator base 42, a balance lifting mechanism 43, a pair of pressure sensors 44 and a pair of clamping tooling 45, the balance lifting mechanism 43 is installed on the fixed machine base 41, and the elevator base 42 is installed on the balance lifting mechanism 43 , a pair of pressure sensors 44 are respectively installed on the fixed machine base 41 and the elevator base 42, a pair of clamping tooling 45 is respectively installed on a pair of pressure sensors 44, a pair of pressure sensors 44 and th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a double-station polishing machine. The double-station polishing machine comprises a rack, a transverse movement driving set, a lifting driving set, a double-station pressure balance device and a polishing set, wherein the double-station pressure balance device comprises a fixing machine base, a lifting machine base, a balance lifting mechanism, a pair of pressure sensors and a pair of clamping tools, wherein the balance lifting mechanism is installed on the fixing machine base, the lifting machine base is installed on the balance lifting mechanism, the pair of pressuresensors are installed on the fixing machine base and the lifting machine base correspondingly, the pair of clamping tools are installed on the pair of pressure sensors respectively, the pair of pressure sensors and the lifting mechanism are connected through signals, the transverse movement driving set is installed on the rack, the fixing machine base is connected with the transverse movement driving set, the lifting driving set is installed on the rack, and the polishing set is connected with the lifting driving set. The double-station polishing machine has the advantages that the structureis simple and reliable, double-station polishing force balance can be achieved, and the product quality can be improved.

Description

technical field [0001] The invention mainly relates to the technical field of polishing machines, in particular to a double-station polishing machine. Background technique [0002] With the continuous popularization and upgrading of electronic products, the demand for glass display screens is increasing, and the quality requirements are also getting higher and higher. Therefore, the glass grinding and polishing process has also been developed rapidly, and more requirements are put forward for polishing machines. high demands. In order to improve the polishing efficiency, the glass casings of 3C products such as mobile phones are generally processed by single-station, double-station or multi-station polishing machines. [0003] Single-station polishing, because only one workpiece is processed, the efficiency is relatively low. Multi-station polishing can polish multiple workpieces at the same time, with high efficiency. However, the workpieces at each station need to be pol...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): B24B29/00B24B27/00B24B49/16B24B41/06B24B41/02
CPCB24B27/0023B24B27/0076B24B29/00B24B41/02B24B41/06B24B49/16
Inventor 刘小平凌建军郭克文文斌
Owner 湖南宇环精密制造有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com