Stable-clamping clamping mechanism for monocrystalline silicon wafer processing

Abstract

The invention relates to the technical field of monocrystalline silicon wafer processing, and discloses a stable-clamping clamping mechanism for monocrystalline silicon wafer processing. The stable-clamping clamping mechanism comprises a moving base, a first electric sliding table is fixedly installed on the left side of the top of the moving base, and a sliding block of the first electric slidingtable is rotatably connected with a rotating plate located on the right side of the first electric sliding table; and a connecting rod is slidably connected to the bottom of the rotating plate, a connector is fixedly connected to the bottom of the connecting rod, and a control device is fixedly installed on the front side of the connector. The stable-clamping clamping mechanism for monocrystalline silicon wafer processing solves the problems that a monocrystalline silicon wafer is formed by cutting a monocrystalline silicon rod through a series of processes, the monocrystalline silicon rod needs to be clamped when being taken out of a single crystal furnace, but an existing clamping mechanism only clamps the monocrystalline silicon rod through friction force in the clamping process, clamping stability cannot be guaranteed, the angle direction of the monocrystalline silicon rod cannot be adjusted after the monocrystalline silicon rod is clamped and taken out, so that the monocrystalline silicon rod is inconvenient to place.

Description

technical field [0001] The invention relates to the technical field of monocrystalline silicon wafer processing, in particular to a clamping mechanism for monocrystalline silicon wafer processing with stable clamping. Background technique [0002] Monocrystalline silicon wafer is a single crystal of silicon, which is a crystal with a basically complete lattice structure. Different directions have different properties. It is a good semiconducting material, used in the manufacture of semiconductor devices, solar cells, etc. High-purity polycrystalline silicon is drawn in a single crystal furnace. Monocrystalline silicon is a relatively active non-metallic element and an important part of crystal materials. It is at the forefront of new material development. Its main purpose is to be used as a semiconductor material And the use of solar photovoltaic power generation, heating and so on. [0003] Single crystal silicon wafers are cut from single crystal silicon rods through a se...

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Problems solved by technology

[0005] Aiming at the deficiencies of the prior art, the present invention provides a clamping mechanism for single crystal silicon wafer processing with stable clamping, which has the advantages of stable clamping and angle adjustment, and solves the problem that single crystal silicon wafers are processed by single crystal silicon rods. It is cut by a series of processes, and the single crystal silicon rod needs to be clamped when it is taken out of the single crystal furnace, but the existing clamping mechanism only clamps by friction when clamping, and cannot guarantee the clamping Stability, and the angle direction of the monocrystalline silicon rod cannot be adjusted after being clamped and taken out, which is not easy to place

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