Device for preparing Topcon battery passivation film layers and technological process thereof

A passivation film and battery technology, applied in metal material coating technology, sustainable manufacturing/processing, coating, etc., can solve the problems affecting the quality of the film layer, affecting the takt time, reducing production capacity, etc., to improve the coating rate, The effect of improving uniformity and reducing floor space

Pending Publication Date: 2021-01-01
盛远
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When preparing the doped polysilicon layer of the Topcon battery, due to the thicker film layer, multiple cavities are required for preparation. For example, when three linearly connected cavities are used to prepare doped amorphous and polycrystalline cavities, each cavity Only one-third of the thickness of the film layer is completed on the body, so as to ensure that the trays are transported backwards with a certain takt time, and the mechanical actions outside the transport process of the tray between the chambers and the coating process will increase, which will seriously affect The takt time is reduced, which reduces the production capacity. At the same time, the same layer of film is plated in separate chambers, which also affects the quality of the film layer.

Method used

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  • Device for preparing Topcon battery passivation film layers and technological process thereof
  • Device for preparing Topcon battery passivation film layers and technological process thereof
  • Device for preparing Topcon battery passivation film layers and technological process thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0041] In this implementation, the coating methods of the coating chamber 52 are plate ALD and PECVD, and a plurality of the coating modules 5 are arranged in a circumferential direction with the vacuum transmission chamber 3 as the center of the circle, and four coating modules 5 ( figure 1 There are six coating modules 5) to carry out synchronous coating operation, each coating module 5 adopts the structure of three laminated coating chambers 52 (also can be more laminated coating chambers 52), three described coating chambers 52 are stacked and arranged sequentially from bottom to top, each coating chamber 52 is an independent vacuum coating chamber, and the three coating chambers 52 are placed in an outer vacuum chamber 51 to realize an inner double vacuum chamber structure. Among them, the two coating modules 5 are for preparing ultra-thin silicon dioxide film layers, and the other two coating modules 5 are for preparing doped amorphous and microcrystalline silicon film la...

Embodiment 2

[0050] In this implementation, the coating methods of the coating chamber 52 are plate type PEALD and PECVD, and a plurality of the coating modules 5 are arranged in a circumferential direction with the vacuum transmission chamber 3 as the center of the circle, and four coating modules 5 ( figure 1 There are six coating modules 5) to carry out synchronous coating operation, each coating module 5 adopts the structure of three laminated coating chambers 52 (also can be more laminated coating chambers 52), three described coating chambers 52 are stacked and arranged sequentially from bottom to top, each coating chamber 52 is an independent vacuum coating chamber, and the three coating chambers 52 are placed in an outer vacuum chamber 51 to realize an inner double vacuum chamber structure. Among them, the two coating modules 5 are for preparing ultra-thin silicon dioxide film layers, and the other two coating modules 5 are for preparing doped amorphous and microcrystalline silicon ...

Embodiment 3

[0059] Different from Embodiment 1 and Embodiment 2, this embodiment adopts UV dissociation method to prepare silicon dioxide layer. In step 3) of the process flow of the device for preparing the Topcon battery passivation film layer, the preheated silicon wafer And the tray 7 is sent to the heating plate 521 in the coating chamber 52 of the coating module 5 of the two coating modules 5 preparing the silicon dioxide film layer by the manipulator 4, and the valve 53 is closed; at first, the oxygen of 500-5000 sccm is passed into, and ozone is generated by UV. Make it oxidize with the silicon atoms on the surface of the silicon wafer to form a silicon dioxide film layer. The continuous introduction of oxygen makes the silicon dioxide film layer formed by oxidation on the surface of the silicon wafer continuously thicken. After 10-120s, the silicon dioxide film layer is completed. Preparation of the silicon dioxide film layer of the wafer.

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Abstract

The invention discloses a device for preparing Topcon battery passivation film layers. The device comprises a loading cavity, a preheating cavity, a vacuum transmission cavity, film coating modules and an unloading cavity, wherein the loading cavity is connected with the preheating cavity, the preheating cavity is arranged at one side of the vacuum transmission cavity, and the plurality of film coating modules are arranged along the periphery of the vacuum transmission cavity. The plurality of film coating modules are arranged in a cluster mode, the unloading cavity is connected with the vacuum transmission cavity, a mechanical hand is arranged in the vacuum transmission cavity, and each film coating module comprises an outer vacuum cavity body and a film coating cavity. The device has thebeneficial effects that by means of the cluster type multi-layer stacked film coating cavities, the productivity can be improved, the occupied area is reduced, the cost is reduced, and the film coating uniformity drop is reduced; and a film coating mode of a plate-type ALD and PECVD combination or a plate-type PEALD and PECVD combination is adopted, so that online doping is realized, the film coating speed is increased, the productivity is improved, and the performance quality requirements of different passivation film layers of Topcon batteries are met.

Description

[0001] A device and process flow for preparing passivation film layer of Topcon battery technical field [0002] The invention relates to the technical field of solar battery coating, in particular to a device for preparing a passivation film layer of a Topcon battery and a process flow thereof. Background technique [0003] The passivation tunneling silicon dioxide layer (SiO2) of Topcon solar cell is prepared on the market 2 ) and doped polysilicon films are mainly prepared by LPCVD equipment, and some are prepared by tubular PEALD and tubular PECVD equipment, and some are prepared by linear transfer plate PECVD equipment. [0004] The preparation method using LPCVD equipment is as follows: the silicon wafer is placed in a quartz boat, and then the quartz boat is passed into a high-temperature quartz tube, the quartz tube is vacuumed, and the process gas is introduced into the quartz boat, and a silicon dioxide layer is formed on the surface of the silicon wafer at a high ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/54C23C16/50C23C16/455C23C16/40C23C16/24C23C16/56H01L31/18
CPCC23C16/24C23C16/402C23C16/45527C23C16/45544C23C16/50C23C16/54C23C16/56H01L31/1804H01L31/1868Y02P70/50
Inventor 盛远
Owner 盛远
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