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Piping apparatus having toxic gas treatment device, design method therefor, and toxic gas treatment facility comprising same

A technology for harmful gas and treatment equipment, which is applied to the piping device with harmful gas processor, its design and the field of harmful gas treatment equipment including the same, can solve the problem of powder generation in the piping connecting the vacuum pump and the scrubber, etc.

Pending Publication Date: 2021-01-22
LOT CES CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Usually, the exhaust gas containing harmful gas generated in the process chamber is exhausted by a vacuum pump, and the exhaust gas is processed in a scrubber, and powder is generated in the piping connecting the vacuum pump and the scrubber, causing problems

Method used

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  • Piping apparatus having toxic gas treatment device, design method therefor, and toxic gas treatment facility comprising same
  • Piping apparatus having toxic gas treatment device, design method therefor, and toxic gas treatment facility comprising same
  • Piping apparatus having toxic gas treatment device, design method therefor, and toxic gas treatment facility comprising same

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Embodiment Construction

[0020] The configuration and functions of the embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

[0021] figure 1 It is a block diagram showing the structure of the harmful gas processing facility using the harmful gas processing apparatus which concerns on one embodiment of this invention. see figure 1 , the harmful gas processing equipment includes an engineering chamber C that produces harmful gas to be processed, a vacuum pump P for discharging the exhaust gas containing harmful gas that occurs in the engineering chamber C, and a scrubber S that processes the exhaust gas discharged from the vacuum pump P, The piping device 10 provided between the vacuum pump P and the scrubber S. The present invention is characterized in that the piping device 10 provided between the vacuum pump P and the scrubber S is figure 1 Other components in the shown harmful gas treatment equipment, except the piping device 10, suc...

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Abstract

According to the present invention, provided is a piping apparatus through which exhaust gas discharged from a process chamber by a vacuum pump flows, the piping apparatus comprising: an exhaust pipeproviding a passage through which the exhaust gas discharged by the vacuum pump flows; and a toxic gas treatment device positioned between the rear end of the vacuum pump and the front end of the exhaust pipe or positioned on the exhaust pipe so as to treat toxic gas contained in the exhaust gas, wherein the toxic gas treatment device comprises a heating means for increasing the temperature of theexhaust gas in order to prevent a sublimation component, from among components included in the exhaust gas, from being sublimated and accumulated inside the exhaust pipe, the heating means is positioned on a section including a sublimation condition occurrence point, at which a sublimation condition of the sublimation component occurs, and an upstream side of the sublimation condition occurrencepoint on the exhaust pipe, and the sublimation condition is a temperature condition for the pressure of the sublimation component.

Description

technical field [0001] The present invention relates to the technology of processing the harmful gas contained in the exhaust gas discharged from the engineering chamber, and more specifically relates to a method for processing the harmful gas contained in the exhaust gas generated in the engineering chamber and discharged through the exhaust pipe at the same time. A piping device of a hazardous gas processor for suppressing generation of powder in an exhaust pipe, a design method thereof, and hazardous gas processing equipment including the same. Background technique [0002] Usually, in order to manufacture semiconductors and displays, a variety of raw materials are injected into the low-pressure engineering chamber, and processes such as ashing, deposition etching, printing, cleaning, and nitriding are performed. This process generates or utilizes harmful gases containing substances equivalent to various volatile organic compounds, acids, odor-causing gases, flammable sub...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67B01D53/00B01D53/32B01D53/86B01D47/00B01D53/78
CPCB01D47/00B01D53/32H01L21/67F27D17/008B01D53/8659B01D2258/0216B01D2257/204B01D2257/2066G01N25/12
Inventor 裵辰镐李侑珍金亨俊罗正均金昊植朱原弘
Owner LOT CES CO LTD