Preparation method of ETFE release film for IC chip
A release film and chip technology, which is applied in the direction of film/sheet adhesive, film/sheet release liner, electrical components, etc., can solve the problems of ETFE release film overall performance decline and other issues
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[0026] A kind of preparation method for the ETFE release film of IC chip, comprises the following steps:
[0027] (1) Get the ETFE resin that is 100:4:3:5 in mass ratio, cross-linking agent, antioxidant and toughening agent mix and add the inner layer of three-layer co-extrusion type extruder, get mass ratio as 100: The 4:3:5 ETFE resin, crosslinking agent, antioxidant and adhesive are mixed with the middle layer of the three-layer co-extrusion extruder, and the mass ratio of ETFE is 100:4:3:5:2 Resin, crosslinking agent, antioxidant, polyethylene wax particles and antistatic agent are added to the outer layer of the 3-layer co-extrusion extruder, and the temperature is raised to melt and extrude the material;
[0028] (2) After laminating the melt-extruded materials through the machine head, the three-layer co-extrusion method is used to melt and extrude through the T-shaped die head. The melt extrusion temperature is 240-280 ° C, and the screw size of the extruder is φ= 20-...
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