Solar cell grid line laser-induced printing method based on silicon wafer double-groove structure
A solar cell and laser-induced technology, applied in circuits, photovoltaic power generation, electrical components, etc., can solve problems such as grid line width fluctuations, achieve stable width, avoid damage, and reduce production costs
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[0036] The present invention will be described in further detail below in conjunction with specific embodiments.
[0037] The specific steps of the solar cell grid line laser-induced printing method based on the double-groove structure of the silicon wafer realized in this embodiment include:
[0038] Step 1: Laser etching double-groove structure to limit the printing area of the grid line: before the texturing of the silicon wafer 2, use the laser 1 to etch two left and right grooves 8 at the preset printing position of the grid line on the silicon wafer 2, and the concave A certain distance l is maintained between the grooves 8 . Such as Figure 1-2 As shown, the groove depth is s and the groove width is w. At this time, the two-groove limiting area 9 is the preset grid line printing area, and the printing of subsequent grid lines 7 will be limited in this area.
[0039] Step 2: Prepare the silver paste film: apply the silver paste on the front of the solar cell to the ...
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