Exposure method and system

An exposure method and technology of an exposure system, which are applied in the field of exposure of exposure machines, can solve the problems of reducing exposure capacity of exposure machines and high exposure requirements, and achieve the effects of increasing exposure capacity, improving curing degree and increasing adhesion.

Inactive Publication Date: 2021-02-26
GIS TECH INC
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  • Summary
  • Abstract
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  • Claims
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Problems solved by technology

[0004] However, the above solution of reducing the exposure speed to achieve the energy conditions required by the dry film will greatly reduce the exposure capacity of the exposure machine, and another solution to achieve the energy conditions required for the dry film by repeated exposure, on the one hand, also It will reduce the exposure capacity of the exposure machine. On the other hand, because repeated exposure needs to be exposed according to a specific and the same pattern, the exposure requirements are relatively high.

Method used

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  • Exposure method and system
  • Exposure method and system

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Embodiment Construction

[0031] The technical solutions of the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings of the present invention.

[0032] In the exposure method and system disclosed in the present invention, a secondary exposure process is added after the development step to expose and strengthen the film on the substrate, thereby increasing the exposure capacity of the exposure machine.

[0033] to combine figure 1 and figure 2 As shown, an exposure method disclosed in the present invention includes the following steps:

[0034] S100, exposing the substrate for the first time according to a specific exposure image, and then developing the substrate to develop the exposure image on the substrate.

[0035] Specifically, such as figure 2 As shown, the substrate here is a substrate with a dry film attached, that is, before the first exposure, a dry film is pasted on the surface of the substrate, and the dry fil...

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Abstract

The invention discloses an exposure method and system. The method comprises the following steps: carrying out primary exposure on a substrate according to a specific exposure image, then carrying outdevelopment on the substrate, and developing an exposure image on the substrate; carrying out secondary exposure on the developed substrate to cure the substrate; and after the secondary exposure, sequentially conducting gold plating and film stripping on the substrate. According to the invention, the two-stage exposure process is added after the development step so as to realize exposure reinforcement of the film on the substrate, so the exposure capacity of an exposure machine is improved.

Description

technical field [0001] The present invention relates to an exposure technology of an exposure machine, in particular to an exposure method and system for improving the exposure capacity of an exposure machine. Background technique [0002] The exposure process of the existing exposure machine generally includes: first paste a dry film on the surface of the substrate to be exposed, and then use the exposure machine to expose the substrate, expose the corresponding graphics on the substrate, and then develop it. The gold-plated area is exposed and gold-plated directly, and then the dry film is washed off from the substrate by stripping the film to complete the gold-plated substrate. Among them, the dry film can produce a polymerization reaction after being irradiated by ultraviolet rays, forming a stable substance attached to the surface of the substrate, so as to achieve the function of blocking electroplating and etching. Depending on factors such as the length of time the ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/2022G03F7/2024
Inventor 朱夏彦陈国军吴景舟马迪
Owner GIS TECH INC
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