Cold trap device and diffusion furnace equipment

Abstract

The embodiment of the invention relates to a cold trap device and diffusion furnace equipment. The cold trap device comprises an outer shell, an inner shell and a cooling pipeline; the outer shell comprises a first air inlet and a first air outlet; the inner shell is located in the outer shell; the inner shell is detachable relative to the outer shell; the inner shell comprises a second air inletand a second air outlet; the second air inlet is communicated with the first air inlet; the second air outlet is communicated with the first air outlet; and the cooling pipeline is positioned in the inner shell. The maintenance time of the cold trap device can be shortened, and the productivity of a machine table is improved.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a cold trap device and diffusion furnace equipment. Background technique [0002] With the advancement of semiconductor manufacturing technology and the increasing demand for electronic devices, the production capacity of semiconductor devices has become the focus of major manufacturers, and the production capacity of semiconductor devices is related to the operating efficiency of process equipment on production line machines, including diffusion furnace equipment. The cold trap device is an important part of the diffusion furnace equipment, and its running time determines the production capacity of semiconductor devices to a certain extent. [0003] At present, the cold trap device mostly uses the low-temperature characteristics of the metal shell of the device to capture the reaction by-products, and the reaction by-product vapor is deposited on the inner wall of the me...

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Problems solved by technology

[0004] However, the maintenance process of the cold trap device in the prior art takes a long time, which will affect the productivity of semiconductor devices

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