Encapsulation of Solid Precursors and Their Applications in Vapor Deposition Processes

Abstract

A packaging container for a solid precursor and its application in a vapor phase deposition process. The packaging container includes: a large bottle body, a bottle cap and at least two small bottle bodies, the large bottle body and the small bottle body are sealed by the bottle cap, and the small bottle body is located in the cavity of the large bottle body; an air inlet pipe and an air outlet pipe are arranged on the bottle cap , the nozzle of the air inlet pipe communicates with the cavity of the large bottle; one side of the small bottle is provided with an air guide hole, the cavity of the smallest small bottle communicates with the nozzle of the outlet pipe, and the air guide hole between adjacent small bottles arranged away from each other. Since the air guide hole is set on one side of the small bottle body, the distance that the carrier gas passes inside the packaging container is not limited by the depth of the packaging container, and the packaging container can effectively utilize the lateral dimensions of the large bottle body and the small bottle body cavity. The contact distance and time with the solid precursor will be significantly increased, making the vapor pressure of the precursor in the gas outlet pipe stable, which can provide a continuous and stable output of the precursor.

Description

technical field [0001] The present application relates to the technical field of vapor phase deposition, in particular to a packaging container of a solid precursor and its application in a vapor phase deposition process. Background technique [0002] Precursors are important raw materials for thin film deposition processes, and are used in vapor deposition (including physical vapor deposition, chemical vapor deposition, and atomic layer deposition) to form various thin film layers that meet the requirements of semiconductor manufacturing. Precursors are key materials for semiconductor chip manufacturing. Its purity and vapor pressure stability directly affect the quality of film formation. [0003] The precursor source bottle is a device used to store precursor materials. During the process of transporting the precursor vapor from the source bottle to the reaction chamber, the precursor needs to have a high enough vapor pressure to satisfy the good volatility of the precurs...

AI Technical Summary

Problems solved by technology

[0004] This application provides a solid precursor packaging container and its application in the vapor phase deposition process to solve the problem of unstable vapor pressure inside the existing solid precursor source bottle and improve the use efficiency of the solid precursor

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