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Hexachlorodisilane purification device and method

A technology of hexachlorodisilane and silane, which is applied in the field of hexachlorodisilane purification, and can solve the problems that pentachlorodisilane cannot be separated cleanly

Active Publication Date: 2021-03-12
ASIA SILICON QINGHAI +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to overcome the problem that pentachlorodisilane cannot be completely separated from hexachlorodisilane in the prior art, and to provide a hexachlorodisilane purification device and method

Method used

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  • Hexachlorodisilane purification device and method
  • Hexachlorodisilane purification device and method
  • Hexachlorodisilane purification device and method

Examples

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Embodiment 1

[0029] Such as figure 1 As shown, in Example 1, a hexachlorodisilane purification device, the purification device specifically includes a raw material tank 1, a reactor 2 and a cooler 3 connected in sequence; the raw material tank 1 is provided with a raw material inlet 11, and the raw material tank 1 is provided with a heater (not shown in the figure); the reactor 2 is provided with an electrode, and the reactor 2 has a gas interface adapted to the chlorine gas inlet pipeline; the cooler 3 is provided with a collection port 31. Specifically, the raw material tank 1 , the reactor 2 and the cooler 3 are arranged from bottom to top, the raw material tank 1 communicates with the lower end of the reactor 2 , and the cooler 3 communicates with the upper end of the reactor 2 . The heater is used to heat the material, that is, to heat the hexachlorodisilane liquid containing pentachlorodisilane. As an embodiment, the heater is a plurality of heat pipes suspended on the top of the raw...

Embodiment 2

[0038] This embodiment has the same inventive concept as Example 1, and a method for purifying hexachlorodisilane is provided on the basis of Example 1. The method specifically includes the following steps:

[0039] S01: The hexachlorodisilane liquid containing pentachlorodisilane is transported to the raw material tank 1 and heated, and the hexachlorodisilane liquid containing pentachlorodisilane starts to gasify and enters the reactor 2; wherein, the heating temperature is 100- 300°C, preferably 200°C, a heating pipe can be installed on the top of the raw material tank 1 to heat the material.

[0040] S02: Pass chlorine gas into the reactor 2, and switch on the power supply of the electrodes in the reactor 2; wherein, the molar ratio of chlorine gas to pentachlorodisilane is 1:1-30:1.

[0041] S03: Extract low-boiling point hydrogen chloride and chlorine gas in the gas phase, and store high-purity hexachlorodisilane liquid in the raw material tank 1 after the reaction is com...

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Abstract

The invention discloses a hexachlorodisilane purification device and method, and belongs to the technical field of hexachlorodisilane purification. The device comprises a raw material tank, a reactorand a cooler which are communicated in sequence; a raw material inlet is formed in the raw material tank, and a heater is arranged in the raw material tank; an electrode is arranged in the reactor, and the reactor is provided with a gas interface matched with a chlorine introducing pipeline; and a collecting opening is formed in the cooler. An electromagnetic field is formed through an electrode to excite chlorine, plasmas containing electrons, active chlorine free radicals, free molecules and radiation light at the same time are obtained, under the induction of the free electrons, the radiation light and the active chlorine free radicals, a hydrogen group is removed from gas-phase pentachlorodisilane formed after heating, then the gas-phase pentachlorodisilane is combined with a chlorinegroup, and therefore, the hexachlorodisilane is converted into hexachlorodisilane, and the yield of the hexachlorodisilane is increased while the purity of the hexachlorodisilane is improved.

Description

technical field [0001] The invention relates to the technical field of hexachlorodisilane purification, in particular to a hexachlorodisilane purification device and method containing pentachlorodisilane. Background technique [0002] Hexachlorodisilane is an important electronic gas, which is widely used in the field of semiconductor device manufacturing. Hexachlorodisilane (Si) produced based on the improved Siemens polysilicon production process 2 Cl 6 ) contains a small amount of pentachlorodisilane (Si 2 Cl 5 H), because the boiling points of the two are close, it is difficult to completely separate pentachlorodisilane from hexachlorodisilane by conventional rectification methods. On this basis, a device and method for deeply purifying hexachlorodisilane Invention seems to be necessary. Contents of the invention [0003] The purpose of the present invention is to overcome the problem that pentachlorodisilane cannot be completely separated from hexachlorodisilane ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/107
CPCC01B33/10778
Inventor 张宝顺宗冰陈海宝刘建华王体虎
Owner ASIA SILICON QINGHAI
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