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Dislocation detection system

A detection system and dislocation technology, applied in the direction of measuring devices, preparation of test samples, and optical testing of flaws/defects, etc., can solve problems such as low efficiency and dependence on manual detection, increase the number of collection points, improve estimation accuracy, The effect of improving detection efficiency

Active Publication Date: 2021-03-26
BEIJING TIANKE HEDA SEMICON CO LTD +3
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  • Claims
  • Application Information

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Problems solved by technology

This method is currently the conventional detection method for the dislocation density of a silicon carbide single wafer, but this method is inefficient because it mainly relies on manual detection.

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Embodiment Construction

[0036] The following will clearly and completely describe the technical solutions in the embodiments of the application with reference to the drawings in the embodiments of the application. Apparently, the described embodiments are only some of the embodiments of the application, not all of them. Based on the embodiments in this application, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the scope of protection of this application.

[0037] The embodiment of the present application provides a dislocation detection system, such as figure 1 As shown, including: focusing module and data processing module; wherein,

[0038] The focus module is used to emit detection light to the sample to be tested according to a preset path, and the sample to be tested is a corroded sheet including a plurality of dislocations; and is used to receive the detection light reflected by the sample to be tested, and forming an image to ...

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Abstract

The application discloses a dislocation detection system, and the system employs a focusing module to emit detection light to a to-be-detected sample according to a preset path, receives the detectionlight reflected by the to-be-detected sample, and forms a detection image according to the received detection light. And then a data processing module is used for automatically identifying the to-be-detected image based on an image processing technology to obtain dislocation information included in the to-be-detected image, so that the purpose of automatically detecting the dislocation information of the to-be-detected sample is achieved, the detection efficiency of the dislocation information of the to-be-detected sample is improved. And compared with a manual dislocation detection method, the number of collection points of the to-be-detected sample can be easily increased, and the estimation precision of the dislocation density can be improved.

Description

technical field [0001] The present application relates to the technical field of semiconductors, and more specifically, to a dislocation detection system. Background technique [0002] Silicon carbide single wafer (or silicon carbide single crystal wafer) is preferentially etched with molten potassium hydroxide to enlarge the dislocation defects in the wafer, and then select several specific areas to take pictures and observe with an optical microscope, and manually count each The total number of dislocations in each observation area and the number of different types of dislocations, and then divided by the area of ​​the observation area, can obtain the average total dislocation density of the silicon carbide single wafer and the average density of various dislocations. This method is currently a conventional detection method for the dislocation density of a silicon carbide single wafer, but this method is inefficient because it mainly relies on manual detection. Contents ...

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Application Information

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IPC IPC(8): G01N21/88G01N1/32
CPCG01N21/8851G01N1/32G01N2021/8887Y02P70/50
Inventor 娄艳芳刘春俊彭同华王波赵宁杨建张平邹宇杨帆
Owner BEIJING TIANKE HEDA SEMICON CO LTD