Device for activating large-volume getter and enhancing adsorption rate by radio-frequency discharge plasma

A plasma and radio frequency discharge technology, used in separation methods, dispersed particle separation, other chemical processes, etc., can solve the problems of long activation time of heated getters and slow adsorption rate of some gases

Active Publication Date: 2021-03-30
DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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  • Abstract
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  • Application Information

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Problems solved by technology

[0006] The present invention is made in view of the above facts, mainly to meet the application requirements of large-volume getters in large and medium-sized industrial devices, and to solve the problems of long activa...

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  • Device for activating large-volume getter and enhancing adsorption rate by radio-frequency discharge plasma

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Embodiment Construction

[0024] The technical solutions in the embodiments of the present invention will be clearly and completely described below in combination with the accompanying drawings in the embodiments of the present invention, and further detailed descriptions will be given, but the embodiments of the present invention are not limited thereto.

[0025] The accompanying drawing is a schematic diagram of a device for activating a large-volume getter by radio frequency discharge plasma and enhancing the adsorption rate, which includes a vacuum chamber, vacuum system components, gas supply system components, radio frequency power supply system, air pressure acquisition system components and suction Aerosol.

[0026]The vacuum chamber consists of 1-hollow container; 2-the upper cover of the sealing flange at the bottom of the vacuum chamber; 3-the lower cover of the sealing flange at the bottom of the vacuum chamber; 4-graphite gasket; 5-screw; 6-nut; 7- The lower cover of the sealing flange at ...

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Abstract

The invention relates to a device for activating a large-volume getter and enhancing the adsorption rate by radio-frequency discharge plasma. The device comprises a vacuum chamber, a vacuumizing system assembly, an air supply system assembly, a radio-frequency power supply system and an air pressure acquisition system assembly. When certain vacuum is obtained in the vacuum chamber through vacuumizing system assemblies such as a ball valve and a mechanical pump, gas types and pressure intensity are adjusted through gas supply system assemblies such as a gas supply source and a mass flow meter.A radio-frequency power supply system composed of a radio-frequency power supply, a high-frequency coaxial line and a radio-frequency coupling coil is started to generate plasmas, and air pressure changes in a cavity are monitored through collection system assemblies such as a vacuum gauge, a vacuum gauge displayer, a digital information collection card and a computer. Plasma generated by the radio-frequency power supply system effectively activates the getter placed in the hollow cylinder with the holes in the wall face, and the getter speed is increased.

Description

technical field [0001] The invention belongs to the field of electromagnetic and material applications, and in particular relates to a device for activating a large-volume getter by radio-frequency discharge plasma and enhancing the adsorption rate Background technique [0002] At present, industrial applications and basic scientific research in many fields need to be carried out in a vacuum environment, including coating, heat treatment, micro-electromechanical systems, surface science, atomic physics, nanotechnology and semiconductor industry. For vacuum technology, the internal vacuum environment and vacuum degree directly affect the working range and efficiency, especially after entering the 21st century, with the continuous improvement of various application indicators and the deepening of basic discipline research, its operation and research All environments require different degrees of high vacuum or even ultra-high vacuum to maintain, which also puts forward higher r...

Claims

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Application Information

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IPC IPC(8): B01J20/02B01D53/02
CPCB01J20/0211B01J20/0214B01J20/0229B01D53/02
Inventor 杨亮石文波李庆伟耿自才周灿华李永钊回晓康金玉奇
Owner DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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