Synchronous diagnosis method, device, medium and electronic equipment for scanning lithography machine
A diagnostic method and technology for a lithography machine, applied in the computer field, can solve the problems of large workload for synchronization problem troubleshooting, complex structure of the scanning lithography machine, affecting the efficiency of diagnosing synchronization problems of the lithography machine, etc., so as to achieve fast and accurate positioning, The effect of ensuring the stability of operation
Active Publication Date: 2022-04-05
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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[0004] However, due to the complex structure of the scanning lithography machine, once there is a problem with the synchronization, the workload of troubleshooting the synchronization problem is huge, which greatly affects the diagnosis efficiency of the synchronization problem of the lithography machine
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[0041] The present application will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application, but not to limit the present application. In addition, it should be noted that, for the convenience of description, the drawings only show some but not all the structures related to the present application.
[0042] Before discussing the exemplary embodiments in greater detail, it should be mentioned that some exemplary embodiments are described as processes or methods depicted as flowcharts. Although the flowchart depicts the steps as a sequential process, many of the steps may be performed in parallel, concurrently, or concurrently. Furthermore, the order of the steps can be rearranged. The process may be terminated when its operation is complete, but may also have additional steps not included in the figures. The process...
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The embodiment of the present application discloses a synchronous diagnosis method, device, medium and electronic equipment of a scanning lithography machine. The method includes: generating a synchronous test case according to the received test object and test parameters; if the test object is a motion controller, sending it through the motion synchronous timing control board; if it is a position sampling controller, aligning the synchronous timing control board At least one of the dose synchronous timing control board, image quality synchronous timing control board, vertical synchronous timing control board and lighting synchronous timing control board is sent through the synchronous servo clock control board; The main system receives the synchronization return value returned by the subsystem under test, and diagnoses the synchronization problem of the test object according to the synchronization return value. Through the implementation of this solution, the synchronization problem of the scanning lithography machine can be quickly and accurately located, without the need for manual diagnosis to consume a lot of labor and time costs, and the effect of ensuring the operation stability of the scanning lithography machine is achieved.
Description
technical field [0001] The embodiments of the present application relate to the field of computer technology, and in particular, to a method, device, medium, and electronic device for synchronous diagnosis of a scanning lithography machine. Background technique [0002] At present, with the rapid development of science and technology, the demand for lithography machines is increasing. A lithography machine is a device that uses photolithography technology to make high-precision chips. At present, in order to meet the development needs of high precision and large size of chips, scanning lithography machines have become the most popular equipment. [0003] The biggest feature of the scanning lithography machine is the synchronous scanning function. The light beam passes through a slit and is projected onto the mask surface through the illumination system, and the mask plate passes the light speed at a set constant speed. At the same time, the silicon wafer moves in the oppo...
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IPC IPC(8): G03F7/20
CPCG03F7/70358G03F7/70483
Inventor 朱晶陈丹谢仁飚张骥于婷
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD