Image stitching processing method, device and electronic system

Abstract

The invention provides an image stitching processing method, a device, and an electronic system. The method comprises the steps of obtaining a first overlapping image and a second overlapping image corresponding to overlapping areas of a first image and a second image to be stitched respectively; determining a fusion energy diagram corresponding to the first overlapping image and the second overlapping image; determining a minimum energy path corresponding to the first graph edge to the second graph edge of the fused energy graph; determining a first mask corresponding to the first overlapping image and a second mask corresponding to the second overlapping image based on the minimum energy path; and stitching the first image and the second image based on the first mask and the second mask. According to the invention, the area through which the abutted seam passes is optimized to a certain extent, and the image splicing effect is improved.

Description

technical field

[0001] The present invention relates to the technical field of image processing, in particular to an image mosaic processing method, device and electronic system. Background technique

[0002] The task of image stitching is to combine multiple images with overlapping fields of view to obtain high-resolution images with a large field of view. This leads to problems such as ghosting and object truncation in the splicing results. The impact of image content misalignment in overlapping areas on splicing can be alleviated to a certain extent by seam search.

[0003] The current mainstream patchwork search method is based on the graph cut (graph cut) algorithm. This algorithm searches for the minimum energy path in the local area of ​​the image through the energy function defined by the difference in image pixel values. However, the energy of the local area is minimized. Important areas with insignificant differences (the area where there are significant targets,...

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