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Polycrystalline silicon reduction furnace base plate, base plate assembly and reduction furnace

A reduction furnace, polysilicon technology, applied in the direction of silicon compounds, inorganic chemistry, non-metallic elements, etc., can solve the problems of large proportion of cauliflower material in the appearance quality of the product silicon rod, high energy consumption of the product, and difficulty in starting the furnace, so as to improve the appearance quality. , the effect of reducing energy consumption and improving growth stability

Active Publication Date: 2021-06-15
CHINA ENFI ENGINEERING CORPORATION
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Polysilicon is the basic raw material for solar cells and integrated circuits. With the rapid development of the photovoltaic industry and the surge in demand for integrated circuits in recent years, the demand for polysilicon as a raw material has increased sharply in recent years. At present, as a key equipment for polysilicon production, the reduction furnace has The conversion rate is low, the appearance quality of the product is poor, and the energy consumption of the product is high.
[0003] In the related technology, the complex growth in the reduction furnace of 60 pairs of rods is not fully grasped, and abnormal situations such as furnace failure and lack of etc. occur during operation, which lead to the limited capacity of a single furnace in the original furnace equipment, and the primary conversion rate is not high. The appearance quality of silicon rods has a large proportion of cauliflower material, and the energy consumption of polysilicon per unit product is high.
For example: CN2072108464.4 polysilicon reduction furnace discloses the internal structure of 48 pairs of polysilicon reduction furnaces, but in actual production, the leap from 48 pairs of rod reduction furnaces to 60 pairs of rod reduction furnaces is too large, and it is difficult to start the furnace in the early stage. It is difficult to operate normally, and the product weight and production energy consumption of a single furnace are quite different from expectations

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  • Polycrystalline silicon reduction furnace base plate, base plate assembly and reduction furnace
  • Polycrystalline silicon reduction furnace base plate, base plate assembly and reduction furnace
  • Polycrystalline silicon reduction furnace base plate, base plate assembly and reduction furnace

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Embodiment Construction

[0029] Embodiments of the invention are described in detail below, examples of which are illustrated in the accompanying drawings. The embodiments described below by referring to the figures are exemplary and are intended to explain the present invention and should not be construed as limiting the present invention.

[0030] Such as Figure 1-Figure 4 As shown, a chassis 100 for a polysilicon reduction furnace according to an embodiment of the present invention includes a tray body 1 and a plurality of electrode base groups 4 .

[0031] The disk body 1 has a plurality of air inlet groups 2 and a plurality of reduced exhaust gas outlet groups 3, each air inlet group 2 includes at least one air inlet 21, and each reduced exhaust gas outlet group 3 includes A plurality of spaced reducing tail gas outlets 31 . Wherein, a plurality of air inlet groups 2 are arranged at intervals along the radial direction of the disk body 1 , and a plurality of reduced exhaust gas outlet groups 3...

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Abstract

The invention discloses a polycrystalline silicon reduction furnace base plate, a base plate assembly and a reduction furnace. The polycrystalline silicon reduction furnace base plate comprises a plate body and a plurality of electrode base groups, and the plate body is provided with a plurality of air inlet sets and a plurality of reduction tail gas outlet sets; the plurality of electrode base groups are arranged on the plate body at intervals along the radial direction of the plate body, each electrode base group comprises a plurality of electrode bases which are arranged at intervals along the circumferential direction of the plate body, and the plurality of electrode base groups and the plurality of air inlet groups are alternately arranged along the radial direction of the plate body; and one reduction tail gas outlet group is positioned on the outer side of the plurality of electrode base groups, and each of the rest reduction tail gas outlet groups is positioned between two adjacent electrode base groups in the radial direction of the plate body. Through the arrangement of the air inlet group and the reduction tail gas outlet group, the temperature field in the polycrystalline silicon reduction furnace is uniform, so that the deposition of silicon rods can be facilitated, and the surface quality of the silicon rods is improved.

Description

technical field [0001] The invention relates to the field of polysilicon production, in particular to a chassis of a polysilicon reduction furnace, a chassis assembly and a reduction furnace. Background technique [0002] Polysilicon is the basic raw material for solar cells and integrated circuits. With the rapid development of the photovoltaic industry and the surge in demand for integrated circuits in recent years, the demand for polysilicon as a raw material has increased sharply in recent years. At present, as a key equipment for polysilicon production, the reduction furnace has The conversion rate is low, the appearance quality of the product is poor, and the energy consumption of the product is high. [0003] In the related technology, the complex growth in the reduction furnace of 60 pairs of rods is not fully grasped, and abnormal situations such as furnace failure and lack of etc. occur during operation, which lead to the limited capacity of a single furnace in the...

Claims

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Application Information

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IPC IPC(8): C01B33/035
CPCC01B33/035
Inventor 石何武汪绍芬石涛杨永亮严大洲
Owner CHINA ENFI ENGINEERING CORPORATION
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