Unlock instant, AI-driven research and patent intelligence for your innovation.

Coating equipment and coating method thereof

A film layer and monomer technology, applied in the field of deposition coating, can solve problems such as difficult assembly, complex device structure, and destruction of chemical monomer structure, and achieve the effect of improving quality

Active Publication Date: 2021-06-18
JIANGSU FAVORED NANOTECHNOLOGY CO LTD
View PDF17 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the method still destroys the chemical monomer structure of the monomer excessively to some extent, and leads to unsatisfactory quality of the formed polymer film layer, and the structure of the device is relatively complicated and difficult to assemble

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Coating equipment and coating method thereof
  • Coating equipment and coating method thereof
  • Coating equipment and coating method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0053] The following description serves to disclose the present invention to enable those skilled in the art to carry out the present invention. The preferred embodiments described below are only examples, and those skilled in the art can devise other obvious variations. The basic principles of the present invention defined in the following description can be applied to other embodiments, variations, improvements, equivalents and other technical solutions without departing from the spirit and scope of the present invention.

[0054] Those skilled in the art should understand that in the disclosure of the present invention, the terms "vertical", "transverse", "upper", "lower", "front", "rear", "left", "right", " The orientation or positional relationship indicated by "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. is based on the orientation or positional relationship shown in the drawings, which are only for the convenience of describing the present invention...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to coating equipment and a coating method. The coating method is used for coating a base material and comprises the steps that the base material is arranged at a position between a monomer release source and a plasma excitation source in a reaction chamber of a chamber body; and a film layer forming material is introduced into the reaction chamber through the monomer release source so as to form a polymer film layer on the surface of the base material under the action of the plasma excitation source, so that the film layer is uniformly formed on the surface of the base material, and the deposition speed is accelerated.

Description

technical field [0001] The present invention relates to depositional coating, and in particular to a coating device and coating method for applying and forming a film on a substrate, said substrate being adapted to be placed on a release source of a film-forming material and a film-forming material between the plasma excitation sources to prevent excessive decomposition of the film forming material during a film forming process. Background technique [0002] Coating equipment configured to form a polymeric coating or film on the surface of a substrate made of materials including, but not limited to, metals, glasses, ceramics, polymers, fibers, powders, and semiconductors , and further improve various properties of the substrate, such as hydrophobicity, hydrophilicity, oleophobicity, anti-rust, anti-mildew, moisture-proof, electrical and thermal conductivity, biomedicine, optics, friction performance. [0003] A typical coating device utilizes plasma vapor deposition method ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/513C23C16/455C23C16/458
CPCC23C16/513C23C16/455C23C16/4583C23C16/4584H01J37/3244H01J37/32H01J2237/3321H01J37/32532C23C16/509B05D1/62B05D1/60B05D1/005C23C16/5093C23C16/45523H01L21/68771C23C16/515C23C16/45508H01L21/67213H01L21/673H01L21/68785C23C16/5096C23C16/26C23C16/50C23C16/448C23C16/517C23C16/505H01J37/32541H01J37/32715H01J37/32761
Inventor 宗坚
Owner JIANGSU FAVORED NANOTECHNOLOGY CO LTD