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Etching solution for microscopic analysis of copper foil and preparation method and etching method thereof

A technology of microscopic analysis and preparation method, which is applied in the field of microscopic analysis of copper foil materials, and can solve problems such as complex sample processing

Active Publication Date: 2021-07-13
JIUJIANG TELFORD ELECTRONICS MATERIAL CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The basis for improving the performance of copper foil is the microscopic analysis of the product. However, the development of domestic copper foil microscopic analysis is currently limited. (SEM), Electron Backscatter Diffraction (EBSD), Scanning Probe Technology (SPM), etc. However, the processing of samples by these analysis methods is very complicated

Method used

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  • Etching solution for microscopic analysis of copper foil and preparation method and etching method thereof
  • Etching solution for microscopic analysis of copper foil and preparation method and etching method thereof

Examples

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Effect test

Embodiment 1

[0025] According to the etching solution for copper foil microscopic analysis described in the embodiment of the present invention, its preparation method comprises the following steps:

[0026] S1 Prepare saturated cupric ammonium chloride ((NH 4 ) 2 CuCl 4 )·H 2 O solution, add (NH 4 ) 2 CuCl 4 Crystalline solid (purity 98%), the temperature of the aqueous solution in the beaker is controlled at 35°C, and (NH 4 ) 2 CuCl 4 Solid until the solid no longer dissolves to obtain a saturated cupric ammonium chloride solution;

[0027] S2 preparation of saturated FeCl 3 Solution, add 5mL dilute hydrochloric acid in 100mL water, continue to add FeCl while stirring 3 solid, the temperature of the aqueous solution in the beaker is controlled at 25°C until the solid is no longer dissolved, and a saturated ferric chloride solution is obtained;

[0028] S3 Prepare the etching solution, use a graduated cylinder to measure 20mL saturated cupric ammonium chloride solution, 10 mL s...

Embodiment 2

[0034] The following uses the etching method described in Example 1 to etch any copper foil on the market, and the etching effect will be further described in detail.

[0035] The effect of metallographic microscope shooting of copper foil before and after etching by etching solution is as follows: figure 1 As shown, the copper surface before etching is rough and has no obvious graininess, and the outline of copper particles cannot be seen directly, which is not conducive to microscopic crystal analysis. After etching, the crystal grain outline on the copper surface is obvious, and the copper particles can be clearly distinguished, which is beneficial to microscopic crystal analysis.

[0036] The SEM and EBSD shooting effects of copper foil before and after etching by etching solution are as follows: figure 2 As shown, the copper surface is flat before etching, and the grains cannot be distinguished, and the microscopic grain size and lattice orientation cannot be analyzed...

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Abstract

The invention discloses an etching solution for microscopic analysis of a copper foil and a preparation method and an etching method thereof. The preparation method of the etching solution comprises the following steps of preparing a saturated copper ammonium chloride solution and a saturated ferric chloride solution, pouring the saturated copper ammonium chloride solution, the saturated ferric chloride solution and HCl into a volumetric flask, conducting mixing, and adding deionized water to a constant volume to obtain the etching solution. After the surface of the copper foil is etched by the etching solution which is prepared from three simple chemical reagents and is used for microscopic analysis of the copper foil, the copper crystal profile can be obviously shown, crystal lattices on the surface of the copper foil can be intuitively observed under a metallographic microscope, the grain size, crystal lattice orientation, crystal boundary and the like can be analyzed under an SEM, and a foundation is laid for microscopic analysis of a copper foil material.

Description

technical field [0001] The invention relates to the technical field of microscopic analysis of copper foil materials, in particular to an etching solution for microscopic analysis of copper foil, a preparation method and an etching method thereof. Background technique [0002] In recent years, with the development of the lithium battery automobile industry and various consumer electronic devices, the supply of copper foil materials used as lithium battery negative electrode collectors and electronic device signal transmission has been in short supply. For this reason, many companies have begun to join the copper foil production team, making the domestic copper foil production higher and higher. [0003] With the development of the copper foil industry, domestic and foreign electrolytic copper foils have been fully integrated, which requires that my country's electrolytic copper foil industry must be considered from a global perspective, and must also have the technical level...

Claims

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Application Information

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IPC IPC(8): C23F1/18
CPCC23F1/18
Inventor 李红琴江泱范远朋
Owner JIUJIANG TELFORD ELECTRONICS MATERIAL CO LTD