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Plasma processing device and heater thereof

A technology for processing devices and heaters, applied in semiconductor/solid-state device manufacturing, discharge tubes, electrical components, etc.

Active Publication Date: 2021-07-16
ADVANCED MICRO FAB EQUIP INC CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The object of the present invention is to provide a plasma processing device and its heater to solve the problem of reducing the loss of radio frequency power

Method used

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  • Plasma processing device and heater thereof
  • Plasma processing device and heater thereof

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Embodiment Construction

[0025] The core of the present invention is to provide a plasma processing device and its heater to solve the problem of reducing the loss of radio frequency power.

[0026] In order to enable those skilled in the art to better understand the technical solutions provided by the present invention, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0027] Such as figure 1 and figure 2 As shown, the heater structure of a plasma processing device provided by the embodiment of the present invention includes a heater 1 arranged on the insulating material window of the plasma processing device, and the heater 1 includes a first sub-heater 11 and a second sub-heater heater 12, the first sub-heater 11 includes a first insulating plate 111 and a first heating wire 112 arranged above the first insulating plate 111, the second sub-heater 12 includes a second insulating plate 121 and a first heating wi...

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Abstract

The invention discloses a plasma processing device and a heater thereof. The heater is arranged on an insulating material window of the plasma processing device, the heater comprises a first sub-heater and a second sub-heater, the first sub-heater comprises a first insulating plate and a first heating wire arranged above the first insulating plate, and the second sub-heater comprises a second insulating plate and a second heating wire arranged on the second insulating plate; the first heating wire and the second heating wire are the same in shape and are aligned up and down, the first heating wire and the second heating wire are connected to the heating power supply in a mutual series connection mode, and the direction of current generated by the heating power supply in the first heating wire is opposite to that of current generated by the heating power supply in the second heating wire. According to the heater structure, the induced current generated when the high-frequency magnetic field penetrates through the first heating wire and the induced current generated when the high-frequency magnetic field penetrates through the second heating wire can just offset each other, and the problem of radio frequency coil power loss caused by the heater is avoided.

Description

technical field [0001] The invention relates to the technical field of etching, in particular to a plasma processing device and a heater thereof. Background technique [0002] With the development of semiconductor manufacturing technology, the requirements for the integration and performance of components are getting higher and higher, and plasma technology is widely used in the manufacture of semiconductor devices. The main plasma processing devices include capacitively coupled (CCP) and inductively coupled (ICP). Among them, the inductively coupled plasma processing device has the advantages of high plasma concentration and fast etching rate, and is currently widely used. [0003] For the plasma processing device, its structure mainly includes a reaction chamber, the top of the reaction chamber is provided with an insulating material window, the bottom of the reaction chamber is provided with a pedestal, the pedestal is used to place the substrate to be processed, a low-fr...

Claims

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Application Information

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IPC IPC(8): H01J37/32H01L21/67
CPCH01J37/32522H01L21/67011H01J2237/334
Inventor 毛杰左涛涛
Owner ADVANCED MICRO FAB EQUIP INC CHINA
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