Substrate pretreatment equipment for producing new materials

A pretreatment, new material technology, applied in water/sewage multi-stage treatment, water/sludge/sewage treatment, cleaning methods and utensils, etc.

Active Publication Date: 2021-07-30
上海纽氪曼科技有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The object of the present invention is to provide a kind of substrate pretreatment equipment for prod

Method used

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  • Substrate pretreatment equipment for producing new materials
  • Substrate pretreatment equipment for producing new materials
  • Substrate pretreatment equipment for producing new materials

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Embodiment Construction

[0035] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0036] see Figure 1-9 , the present invention provides a technical solution: a substrate pretreatment device for producing new materials, including a cleaning box 1 with a built-in ultrasonic transmitter, and a cleaning mechanism is slidably installed on the upper end of the cleaning box 1, and the cleaning mechanism is used for cleaning and cleaning The dirt suspended on the liquid surface of the cleaning liquid in the box 1, along the sliding direction of the cl...

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Abstract

The invention discloses substrate pretreatment equipment for producing new materials in the field of new material production. The substrate pretreatment equipment mainly comprises a cleaning box with a built-in ultrasonic transmitter, a cleaning mechanism is slidably mounted at the upper end of the cleaning box, the cleaning mechanism is used for cleaning dirt suspended on the liquid level of cleaning liquid in the cleaning box, and along the sliding direction of the cleaning mechanism, a dirt collecting barrel and a cleaning liquid supplementing barrel are arranged at one end of the cleaning box. According to the substrate pretreatment equipment, automatic cleaning can be carried out on the dirt suspended on the liquid level of the ultrasonic cleaning liquid, the dirt leaves the ultrasonic cleaning box, liquid is automatically supplemented into the ultrasonic cleaning box, it is guaranteed that the cleaning liquid in the ultrasonic cleaning box is sufficient and clean, and the situation that substrates are polluted, and the production efficiency of the new materials is affected is avoided.

Description

technical field [0001] The invention belongs to the field of new material production, and specifically relates to a substrate pretreatment device for producing new materials. Background technique [0002] CVD is the abbreviation of Chemical Vapor Deposition, which refers to the gas phase reaction at high temperature, for example, thermal decomposition of metal halides, organic metals, hydrocarbons, hydrogen reduction or chemical reaction of its mixed gas at high temperature to precipitate metals, The method of inorganic materials such as oxides and carbides, with the development of science and technology, the CVD method has been applied to the refining of high-purity metals, powder synthesis, semiconductor thin films, etc., and is a characteristic new material production equipment method. [0003] When the CVD method prepares new materials, it needs to use the substrate as the bottom, and the reaction gas is introduced to react on the substrate, so that the new material powd...

Claims

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Application Information

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IPC IPC(8): B08B3/12B08B3/14B08B13/00C02F9/02
CPCB08B3/12B08B3/14B08B13/00C02F9/00Y02W30/62
Inventor 吴攀张亮
Owner 上海纽氪曼科技有限公司
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