Solder resist film removal method and solder resist film removal solution
Patent Information
- Authority / Receiving Office
- CN Β· China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- TEAN ELECTRONICS DA YA BAY CO LTD
- Publication Date
- 2021-09-03
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Abstract
Description
technical field
[0001] The invention relates to the technical field of power circuits, in particular to a solder resist film removal method and a solder resist film removal solution. Background technique
[0002] With the development trend of miniaturization and high density of electronic products, the aperture of the via hole is getting smaller and smaller, and the requirements for rework (rework) of solder mask stripping are getting higher and higher. When PTH (PTH is the abbreviation of Plated Through Hole, plated through hole is the meaning of metallized hole) via hole <0.2mm, it is easy to cause abnormalities such as ink plugging and poor backwashing.
[0003] In the existing process flow: bad board β insert frame β soaking in liquid medicine tank (time 50-60min, temperature 80-90β) β washing soaking 1 (time 10min) β washing soaking 2 (time 10min) β high-pressure water gun washing β developing Punching (relative moving speed 1m / min) β plate collection (Note: The pot...