Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Graphical photosensitive resin coating and manufacturing method thereof, circuit structure and capacitive touch screen

A technology of photosensitive resin and production method, which is applied in the direction of photosensitive materials used in optomechanical equipment, electrical digital data processing, instruments, etc., and can solve problems such as poor refractive index, large opening area, and large photosensitive resin coating area , to achieve the effect of saving area, reducing area and preventing the appearance from being affected

Pending Publication Date: 2021-08-24
SHANTOU GOWORLD DISPLAY TECH CO LTD +2
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, when the slope angle of the slope is too small, the slope will become very wide, requiring a large amount of photosensitive resin coating area, and when it is applied to the bridge point of the touch screen, the area of ​​the bridge point has to be designed very large; generally For example, in the circuit film layer of the touch screen, there is a very large refractive index difference between the photosensitive resin coating and other film layers. When the area of ​​the bridge point is too large, the reflected light will make the bridge point look very obvious, affecting the Appearance of capacitive touch screen
[0005] In addition, some capacitive touch screens also use the above-mentioned openings of the photosensitive resin coating to realize the connection of the two conductive film layers. The openings also have the above-mentioned edges, so that the area of ​​the openings is also very large, which will affect the circuit layout of the capacitive touch screen.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Graphical photosensitive resin coating and manufacturing method thereof, circuit structure and capacitive touch screen
  • Graphical photosensitive resin coating and manufacturing method thereof, circuit structure and capacitive touch screen
  • Graphical photosensitive resin coating and manufacturing method thereof, circuit structure and capacitive touch screen

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] Such as Figure 1-Figure 6 As shown, this patterned photosensitive resin coating 1 is arranged on a surface of the substrate 0, and a first axis and a second axis orthogonal to each other are defined based on the surface of the substrate 0; along the first axis, the photosensitive resin coating Layer 1 has at least one first edge slope 11, the slope angle of the first edge slope 11 is smaller than the slope angle of other edge slopes; along the second axis, the photosensitive resin layer 1 has at least one second edge slope 12, the second edge slope The slope angle of 12 is greater than the slope angles of other edge slopes; the photosensitive resin coating 1 is coated with a negative photosensitive resin and exposed and cured by an anisotropic ultraviolet light source 5, and the anisotropic ultraviolet light source 5 is formed at the first edge slope 11 The light scattering angle is the first light scattering angle 501, the light scattering angle of the anisotropic ult...

Embodiment 2

[0047] refer to Figure 7 , in the case that other parts are the same as in Embodiment 1, the difference is that in this embodiment, the anisotropic ultraviolet light source 5' includes an ultraviolet lamp 51' and a plurality of U-shaped baffles 52', and each U-shaped The baffles 52' are stacked in sequence to form a baffle group with a strip-shaped cavity, and the ultraviolet lamp 51' is located in the strip-shaped cavity. The graphic mask 4 is directly attached to the substrate 0 . During operation, the ultraviolet light emitted by the ultraviolet lamp tube 51' passes through the gap between the lower edges of each U-shaped block 52', and then irradiates towards the photosensitive resin coating 1 on the substrate 0 through the non-shading part of the pattern mask plate 4. , due to being blocked by each U-shaped baffle 52', the first light scattering angle 501 of the anisotropic ultraviolet light source 5' along the first axis can be larger than other light scattering angles...

Embodiment 3

[0049] refer to Figure 8 , in the case that other parts are all the same as in Embodiment 1, the difference is that in this embodiment, the upper surface of the photosensitive resin coating 1 is provided with a square hole 10 penetrating up and down, and the cross-sectional area of ​​the square hole 10 is from Tapered from top to bottom, the inner wall of the square hole 10 has two first edge slopes 11 opposite to each other along the first axis and two second edge slopes 12 opposite to each other along the second axis.

[0050] The circuit structure 2' provided in this embodiment includes a first conductive layer 21', an insulating layer 22' and a second conductive layer 23' sequentially arranged on the substrate 0 from inside to outside, and the insulating layer 22' is the patterned Photosensitive resin coating 1, the first conductive layer 21' extends to the bottom of the square hole 10, and the second conductive layer 23' extends from a first edge slope 11 of the insulati...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
angleaaaaaaaaaa
Login to View More

Abstract

The invention relates to a graphical photosensitive resin coating and a manufacturing method thereof, a circuit structure and a capacitive touch screen. The photosensitive resin coating is provided with at least one first edge slope along a first axial direction, and the slope angle of the first edge slope is smaller than that of other edge slopes; in the second axial direction, the photosensitive resin layer is provided with at least one second edge slope, and the slope angle of the second edge slope is larger than that of other edge slopes; the photosensitive resin coating is formed by coating negative photosensitive resin and exposing and curing the negative photosensitive resin through an anisotropic ultraviolet light source, the light scattering angle of the anisotropic ultraviolet light source at the first edge slope is a first light scattering angle, and the light scattering angle of the anisotropic ultraviolet light source at the second edge slope is a second light scattering angle; the first light scattering angle is larger than the second light scattering angle; the first edge slope is used for arranging a conduction circuit. According to the invention, the area of the photosensitive resin coating can be greatly saved under the condition of ensuring circuit conduction, and the area of a bridge point can be effectively reduced in bridging connection.

Description

technical field [0001] The invention relates to the technical field of touch screens, in particular to a patterned photosensitive resin coating, a manufacturing method thereof, a circuit structure and a capacitive touch screen. Background technique [0002] The patterned photosensitive resin coating obtained by coating and patterning (such as exposure and development) by photosensitive resin can generally be used as an insulating layer of bridge points and applied on capacitive touch screens. The bridge point is the jumper structure commonly used on capacitive touch screens. It generally includes electrodes in the first direction, an insulating layer and electrodes in the second direction. The electrodes in the first direction pass through the bottom of the insulating layer along the first direction, and the electrodes in the second direction pass The two directions straddle the insulating layer, so that the electrodes in the first and second directions do not come into cont...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004G06F3/044
CPCG03F7/004G06F3/0445
Inventor 沈奕王双喜吕岳敏陈远明
Owner SHANTOU GOWORLD DISPLAY TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com