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Photoresist supply device

A photoresist supply and photoresist technology, applied in optics, optomechanical equipment, instruments, etc., can solve the problems of photoresist unevenness, photoresist doping bubbles, yield drop, etc., and improve product quality. efficiency, low cost, and the effect of reducing waste

Active Publication Date: 2021-09-03
CHANGXIN MEMORY TECH INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the photoresist output by the existing photoresist supply device is often doped with air bubbles and impurity particles
When the output photoresist contains air bubbles and impurity particles, the photoresist coated on the wafer will be uneven, resulting in a decrease in yield

Method used

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Embodiment Construction

[0033] The present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, but not to limit the present invention. In addition, it should be noted that, for the convenience of description, only some structures related to the present invention are shown in the drawings but not all structures.

[0034] figure 1 is a schematic structural diagram of a photoresist supply device provided by an embodiment of the present invention, as shown in figure 1 As shown, the photoresist supply device includes: a cleaning structure 10 and a storage structure 20; the cleaning structure 10 includes a first photoresist inlet 11 and a first photoresist outlet 12; the storage structure 20 includes a second photoresist inlet 21 and the second photoresist outlet 22; the first photoresist outlet 12 is connected with the second ...

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Abstract

The embodiment of the invention discloses a photoresist supply device. The photoresist supply device comprises a cleaning structure and a storage structure; the cleaning structure comprises a first photoresist inlet and a first photoresist outlet; the storage structure comprises a second photoresist inlet and a second photoresist outlet; the first photoresist outlet is connected with the second photoresist inlet; an ultrasonic generator is arranged in the cleaning structure; the ultrasonic generator is used for generating ultrasonic waves, separating bubbles in the photoresist solution in the cleaning structure from the photoresist solution and gathering impurity particles in the photoresist solution; and the storage structure is used for storing the photoresist solution subjected to ultrasonic treatment. According to the photoresist supply device provided by the embodiment of the invention, the effect of reducing bubbles and impurity particles in the output photoresist is achieved.

Description

technical field [0001] Embodiments of the present invention relate to the technical field of semiconductors, and in particular to a photoresist supply device. Background technique [0002] In the semiconductor manufacturing process, the photolithography process is one of the key steps in the integrated circuit manufacturing process, and its stability and reliability have an important impact on the quality of the product. [0003] The photolithography process first uses a photoresist supply device to coat photoresist on the wafer to form a layer of photoresist film, then irradiates parallel light on the photoresist film layer through a mask to expose it, and finally Use the developing solution to develop and complete the pattern transfer. However, the photoresist output by the existing photoresist supply device is often doped with air bubbles and impurity particles. When the output photoresist contains air bubbles and impurity particles, the photoresist coated on the wafer ...

Claims

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Application Information

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IPC IPC(8): G03F7/16
CPCG03F7/16H01L21/6715H01L21/67017
Inventor 董必志
Owner CHANGXIN MEMORY TECH INC
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