Precise metal mask and etching laser composite manufacturing method thereof

Abstract

The invention provides a precise metal mask and an etching laser composite manufacturing method thereof. The precise metal mask is characterized in that one side surface of a metal substrate is a first main surface, the other side surface of the metal substrate is a second main surface, the metal substrate is provided with a plurality of exposed holes, the exposed holes are provided with etching holes in the first main surface, the exposed holes are provided with laser holes in the second main surface, the etching holes and the laser holes of which the centers coincide communicate with each other, outer openings of the etching holes are large, inner openings of the etching holes are small, the outer openings and the inner openings are in transition connection through a concave arc hole wall, an inclined included angle of a connecting line of the outer openings and the inner openings is an evaporation angle, the laser holes are provided with vertical hole walls, and the laser holes have high-precision hole diameters. The manufacturing method comprises the following steps: completely coating a solid photoresist layer on the first main surface and the second main surface of the metal substrate; performing a single-side exposure and development process on the first main surface to manufacture a first hollowed-out area; performing a single-side etching process on the first hollowed-out area to etch a recessed area; and performing a laser process in the recessed area to bombard and engrave a through hole.

Description

technical field [0001] The invention belongs to the technical field of OLED evaporation process technology, and relates to the manufacture of a metal mask, in particular to a precision metal mask and its etching laser composite manufacturing method. Background technique [0002] The precision metal mask is mainly used in the OLED evaporation process. The evaporation materials of RGB three colors pass through the holes on the precision metal mask to accurately define the position, shape, and size on the glass substrate. The size of the evaporation angle It will affect the ease of vapor deposition materials passing through the precision metal mask, and too large vapor deposition angle will easily cause hole blocking; in addition, the accuracy of the opening width of the holes will affect the size accuracy of the vapor deposition materials defined on the glass substrate. [0003] At present, there are roughly three methods of manufacturing precision metal masks, namely, electro...

AI Technical Summary

Problems solved by technology

The size of the hole formed by the etching method is difficult to achieve the accuracy of the laser method, mainly because the main surface formed by the etching method and the side wall of the hole opening will have a slope to form a sharp point. The stability of the pore is not good, and it is easy to cause the accuracy of the hole size to deteriorate due to the length error of the etching time. Therefore, the current accuracy is about ±3um.

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