Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Long-wave infrared imaging optical system

An imaging optics and long-wave infrared technology, which is applied in the field of long-wave infrared imaging optical systems, can solve the problems of reduced imaging quality, blurred images, and decreased contrast of optical systems, and achieves easy follow-up processing and adjustment, reduced overall weight, and improved system structure. simple effect

Active Publication Date: 2021-10-22
苏州东方克洛托光电技术有限公司
View PDF7 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Under different temperature conditions, due to the thermal effect of optical materials and mechanical materials, some parameters such as the focal length and total length of the optical system will change accordingly, and then the optimal image plane of the system will deviate, resulting in a decrease in the imaging quality of the optical system and blurred images. clear, the contrast drops, which ultimately affects the performance of the

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Long-wave infrared imaging optical system
  • Long-wave infrared imaging optical system
  • Long-wave infrared imaging optical system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0046] The parameters (radius, thickness, material, conic coefficient etc.) of each optical element among the present invention are as shown in table 1, and in the table, R is the radius of curvature of the optical surface, t is the distance with the latter optical surface, and D is the optical surface caliber, k is the conic coefficient of the optical surface, α 2 、α 3 、α 4 They are the coefficients of the fourth power, sixth power, and eighth power of the radial coordinates of the optical surface, respectively.

[0047] Table 1

[0048]

[0049] NOTE: Rotationally symmetric polynomial aspheres are described by polynomial expansions of deviation spheres (or aspheres defined by conic coefficients). The even-order asphere model describes the asphere in terms of even powers of radial coordinates only. This model uses the basic radius of curvature and conic factor. The surface coordinates are given by:

[0050]

[0051] Above-mentioned embodiment 1 can reach following...

Embodiment 2

[0061] The parameters (radius, thickness, material, conic coefficient, etc.) of each optical element in Example 2 of the present invention are shown in Table 2.

[0062] Table 2

[0063]

[0064]

[0065] Above-mentioned embodiment 2 can reach following index:

[0066] a) Focal length: 28.04mm;

[0067] b) F / #: 1;

[0068] c) Band: 8 ~ 14um;

[0069] d) Field of view: ±8°×±6°;

[0070] e) MTF: 0.42@42lp / mm, on-axis field of view;

[0071] f) Distortion: <|1|%;

[0072] g) Relative illuminance: >91%;

[0073] h) Ambient temperature: -40℃~60℃

Embodiment 3

[0075] The parameters (radius, thickness, material, conic coefficient, etc.) of each optical element in Example 3 of the present invention are shown in Table 3.

[0076] table 3

[0077]

[0078]

[0079] Above-mentioned embodiment 3 can reach following index:

[0080] a) Focal length: 27.93mm;

[0081] b) F / #: 1;

[0082] c) Band: 8 ~ 14um;

[0083] d) Field of view: ±8°×±6°;

[0084] e) MTF: 0.43@42lp / mm, on-axis field of view;

[0085] f) Distortion: <|1|%;

[0086] g) Relative illuminance: >94%;

[0087] h) Ambient temperature: -40℃~60℃

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Radius of curvatureaaaaaaaaaa
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Login to View More

Abstract

The invention relates to a long-wave infrared imaging optical system. The system is sequentially provided with a window W1, a lens L1, a lens L2, a lens L3 and a CCD window W2 which share the same optical axis in the light propagation direction. The lens L1 and the lens L3 are positive meniscus lenses, the lens L2 is a negative meniscus lens, and the convex surfaces of the lens L1, the lens L2 and the lens L3 face the light incidence direction; the front surface of the lens L1 is a spherical surface, and the rear surface is an even-order aspheric surface; the lens L2 and the lens L3 are spherical lenses. The system is greatly simplified, the overall weight of the imaging system is reduced, and the imaging quality of the optical system can be close to the diffraction limit within the temperature range of-40 DEG C to 60 DEG C.

Description

technical field [0001] The invention belongs to the technical field of optical design and relates to a long-wave infrared imaging optical system. Background technique [0002] Today's infrared imaging combines mechanical, electronic, optical and other related technologies, and the infrared imaging optical system is an extremely important part of the system. The imaging quality and resolution of the infrared optical system directly affect the accuracy of search and tracking. So the quality of optical imaging system design determines the success or failure of the design. [0003] With the development of infrared technology, people have higher and higher quality requirements for infrared imaging optical systems, especially infrared imaging systems are often required to work in a large temperature range. Under different temperature conditions, due to the thermal effect of optical materials and mechanical materials, some parameters such as the focal length and total length of t...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G02B13/18G02B13/14
CPCG02B13/0035G02B13/008
Inventor 王健孙金霞韩希珍曲锋刘焕宝
Owner 苏州东方克洛托光电技术有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com