Method for reducing noon break proportion of mango stomata
A technology of mango and stomata, which is applied in the field of plant cultivation, can solve the problems of reducing the ratio of mango stomata and no orchard, and achieve the effect of increasing the number of stomata, reducing the ratio of midday and improving fruit quality
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0029] 1) Select adult mango trees;
[0030] 2) Confirm the lunch break time of mango by observing the opening and closing ratio of stomata on the lower epidermis of mango leaves at different time periods;
[0031] 3) During the lunch break of mango stomata, spray water on the leaf surface continuously for 10 minutes, and then spray again after an interval of 30 minutes.
[0032] 4) No stomata open.
Embodiment 2
[0034] 1) Select adult mango trees;
[0035] 2) Confirm the lunch break time of mango by observing the opening and closing ratio of stomata on the lower epidermis of mango leaves at different time periods;
[0036] 3) During the lunch break of mango stomata, spray water continuously on the leaf surface for 20 minutes, and then spray the next time after an interval of 10 minutes, which can be sprayed 1-6 times.
[0037] 4) The average stomatal opening rate is 45%;
Embodiment 3
[0039] 1) Select adult mango trees;
[0040] 2) Confirm the lunch break time of mango by observing the opening and closing ratio of stomata on the lower epidermis of mango leaves at different time periods;
[0041] 3) During the lunch break of the mango stomata, spray water on the leaf surface continuously for 20 minutes, and then spray the next time after an interval of 20 minutes, which can be sprayed 1-6 times;
[0042] 4) The average stomatal opening rate is 57%.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com