Electromagnetic shielding and laser eavesdropping blocking two-in-one film and preparation method thereof
A technology of electromagnetic shielding and electromagnetic shielding layer, which is applied in the field of electromagnetic shielding, laser eavesdropping and blocking two-in-one film and its preparation, can solve the problems of inconvenient construction, shortened life, and affecting normal lighting, etc., and achieves simple structure, reduced use, and improved Effect of Visible Light Transmittance
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Embodiment 1
[0035] A method for preparing an electromagnetic shielding laser eavesdropping blocking two-in-one film, comprising the following steps:
[0036] (1) coating a scratch-resistant layer on one side of the substrate layer, wherein the thickness of the scratch-resistant layer is 3 μm, and the thickness of the substrate layer is 23 μm;
[0037] (2) Evenly disperse the laser wiretapping blocking material in a solvent containing pressure-sensitive adhesive to form a coating for the laser wiretapping blocking layer, and coat it on another layer of the substrate layer, the formula of the laser wiretapping blocking material Cesium tungsten bronze, ATO, and ITO in a ratio of 1:1:1, the total amount of cesium tungsten bronze, ATO, and ITO added is 4g / ㎡, and the thickness of the laser eavesdropping blocking layer is 6μm;
[0038] (3) Magnetron sputtering electromagnetic shielding layer on another substrate layer, and combining the electromagnetic shielding layer with the laser blocking lay...
Embodiment 2
[0040] A method for preparing an electromagnetic shielding laser eavesdropping blocking two-in-one film, comprising the following steps:
[0041] (1) The laser eavesdropping blocking material is evenly added to the substrate layer material to produce the laser eavesdropping blocking substrate layer. The formula of the laser eavesdropping blocking material is cesium tungsten bronze, ATO, cesium tungsten bronze, The total amount of ATO added is 3g / ㎡, and the thickness is 23μm or other thicknesses;
[0042] (2) Magnetron sputtering electromagnetic shielding layer on one side of the laser eavesdropping blocking substrate layer, and the other side is coated with an anti-scratch layer, and the thickness of the anti-scratch layer is 3 μm;
[0043] (3) After coating the pressure-sensitive adhesive on the outside of the electromagnetic shielding layer, it is compounded with the release film. The electromagnetic shielding layer is AZO with a thickness of 92nm, Ag with a thickness of 16-...
Embodiment 3
[0045] A method for preparing an electromagnetic shielding laser eavesdropping blocking two-in-one film, comprising the following steps:
[0046](1) Magnetron sputtering electromagnetic shielding layer on one side of the substrate layer, the electromagnetic shielding layer is a three-layer structure of AZO, 16-20nm Ag, and 45nm AZO with a thickness of 45nm prepared by magnetron sputtering, and the other side Coating an anti-scratch layer, the thickness of the anti-scratch layer is 3 μm, and the thickness of the substrate layer is 23 μm;
[0047] (2) The laser eavesdropping blocking material is dispersed in the pressure-sensitive adhesive coating and coated on the electromagnetic shielding layer, and finally compounded with the release film. The formula of the laser eavesdropping blocking material is cesium tungsten bronze and ATO in a ratio of 1:1 , The total amount of cesium tungsten bronze and ATO added is 3g / ㎡, the thickness of the laser eavesdropping blocking pressure-sens...
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