Flow rate ratio control system, film forming system, abnormality diagnosis method, and abnormality diagnosis program medium
A technology of proportional control and abnormal diagnosis, applied in the direction of flow control, control/regulation system, flow control using electrical devices, etc.
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[0041] Hereinafter, an embodiment of the flow proportional control system of the present invention will be described with reference to the drawings.
[0042] The flow ratio control system 100 of this embodiment is used in semiconductor processes, such as figure 1 As shown, it is used to supply fluid at a desired flow rate ratio to a plurality of supply ports provided in the downstream film forming chamber C.
[0043] In addition, upstream of the flow rate proportional control system 100 is provided, for example, a plurality of mass flow controllers, and a gas panel GP for supplying fluid at a predetermined flow rate to the flow rate proportional control system is provided. Furthermore, the gas panel GP, the flow ratio control system 100 and the film forming chamber C constitute a film forming system 200 for forming a film on a substrate.
[0044] Specific as figure 1 As shown, the flow proportional control system 100 has: a plurality of shunt channels 1 arranged side by side...
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