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Magnetic control modulus plane polishing device and method

A polishing device and plane technology, applied in the polishing field, can solve the problems of low polishing accuracy, large air magnetic resistance, difficult to adjust the polishing gap in real time, etc., and achieve the effect of improving polishing accuracy and improving flexible movement.

Active Publication Date: 2021-11-19
ZHEJIANG NORMAL UNIVERSITY
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Problems solved by technology

However, the current control of the magnetic field is mainly achieved by controlling the polishing gap. However, due to the very large air magnetic resistance, the magnetic field decays very quickly, and it is difficult to adjust the polishing gap in real time during the polishing process. Material removal is uneven, and there is obvious over-polishing or under-polishing, resulting in low polishing accuracy

Method used

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  • Magnetic control modulus plane polishing device and method
  • Magnetic control modulus plane polishing device and method
  • Magnetic control modulus plane polishing device and method

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Embodiment Construction

[0033] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0034] The object of the present invention is to provide a magnetron modulus plane polishing device and polishing method, which improves the polishing precision.

[0035] In order to make the above objects, features and advantages of the present invention more comprehensible, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0036] figure 1 It is a structural schematic dia...

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Abstract

The invention relates to a magnetic control modulus plane polishing device and method. The polishing device comprises a rack, an X-axis movement module, a Y-axis movement module, a Z-axis movement module, a spindle motor, a polishing head, a workbench and a controller. The X-axis movement module is installed above the Y-axis movement modules, the Y-axis movement module is installed on a rack bottom plate, the spindle motor is installed on the Z-axis movement module, the polishing head is installed at the output end of the spindle motor, and the workbench is installed on the X-axis movement module and located below the polishing head. The polishing head comprises a magnetic field generator and a pre-structured elastomer polishing sheet. The controller is connected with the X-axis movement module, the Y-axis movement module, the Z-axis movement module, the spindle motor and the magnetic field generator. The magnetic field generator is used for adjusting the elastic modulus and the shear modulus when the pre-structured elastomer polishing sheet is used for polishing the surface of a workpiece to be polished, and the controller is used for controlling the magnetic field intensity of the magnetic field generator. According to the magnetic control modulus plane polishing device and method, the polishing precision is improved.

Description

technical field [0001] The invention relates to the technical field of polishing, in particular to a magnetic control modulus plane polishing device and a polishing method. Background technique [0002] At present, the polishing methods mainly include manual polishing, mechanical polishing, and vibration polishing. The polishing method mainly uses a rigid polishing head, but it is difficult to polish complex curved surfaces, and the yield rate is not high and the polishing efficiency is low. Due to the complicated polishing process and high technical requirements for operators, the electrochemical polishing method produces more waste gas and waste water and causes serious environmental pollution, which is not in line with green manufacturing. [0003] As an emerging flexible polishing technology, magnetorheological polishing is more and more favored by polishing industry experts for its controllable flexibility, but there are still many shortcomings. The main advantage is th...

Claims

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Application Information

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IPC IPC(8): B24B29/02B24B27/02B24B41/06B24B47/12B24B55/00
CPCB24B29/02B24B27/02B24B41/06B24B47/12B24B55/00
Inventor 高春甫周崇秋鄂世举贺新升罗罕频黄平李林峰金泓凯
Owner ZHEJIANG NORMAL UNIVERSITY
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