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Laser alignment fixture for a reactor system

A reactor system, laser technology, applied in the direction of using optical devices, instruments, scientific instruments, etc., can solve problems such as difficulty in achieving the desired position, undesired processing results, difficulties, etc.

Pending Publication Date: 2021-11-19
エーエスエムアイピーホールディングベーフェー
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, achieving a desired position of the susceptor or other component in the reaction chamber can be difficult, and errors in such positioning can lead to undesirable process results
[0004] Circumstances may make it difficult to achieve the desired position

Method used

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  • Laser alignment fixture for a reactor system
  • Laser alignment fixture for a reactor system
  • Laser alignment fixture for a reactor system

Examples

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Embodiment Construction

[0016] While certain embodiments and examples are disclosed below, those skilled in the art will appreciate that the disclosure extends beyond the specifically disclosed embodiments and / or uses of the disclosure and obvious modifications and equivalents thereof. Therefore, it is intended that the scope of the present disclosure not be limited by the specific embodiments described herein.

[0017] The illustrations presented herein are not intended to be actual views of any particular material, device, structure, or arrangement, but are merely representations used to describe embodiments of the disclosure.

[0018] As used herein, the term "substrate" may refer to any one or more underlying materials or materials that may be used, or upon which a device, circuit, or film may be formed.

[0019] As used herein, the term "atomic layer deposition" (ALD) may refer to a vapor deposition process in which a deposition cycle, preferably a plurality of successive deposition cycles, is p...

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PUM

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Abstract

A laser alignment fixture for a reactor system may be used to align components of the reactor system to allow for a uniform deposition of a thin film onto a substrate. The laser alignment fixture may comprise: a lid assembly; and a plurality of laser and sensor assemblies. The laser alignment fixture may align at least: a flow control ring, a susceptor, and a side wall of the reactor system.

Description

technical field [0001] The present disclosure generally relates to a laser alignment fixture for positioning components within a reactor system. A related fixture is disclosed in U.S. Patent Application No. 62 / 985,184, entitled "Alignment Fixture for a Reactor System," filed March 4, 2020, the contents of which are incorporated by reference in their entirety to the extent they do not conflict with this disclosure. Incorporated into this article. Background technique [0002] Reaction chambers can be used to deposit layers of various materials onto semiconductor substrates. A semiconductor can be placed on a susceptor within the reaction chamber. Both the substrate and susceptor can be heated to a desired substrate temperature set point. During exemplary substrate processing, one or more reactant gases may be passed over a heated substrate, causing a thin film of material to be deposited on the substrate surface. Throughout subsequent deposition, doping, photolithography,...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/50C23C14/54C23C16/458C23C16/52H01L21/67
CPCC23C14/50C23C14/54C23C16/458C23C16/52H01L21/67011H01L21/681C23C16/4585G01B11/272Y02E30/30G01N21/0303H01L29/0665
Inventor S.甘古力T.R.邓恩A.金蒂
Owner エーエスエムアイピーホールディングベーフェー