Acid-and-alkali-resistant wallpaper for laboratory and preparation method thereof
A laboratory-use, acid-alkali-resistant technology, which is applied in textiles and papermaking, can solve the problems of unsatisfactory acid-alkali resistance and high acid-alkali resistance requirements of wallpaper, and achieve high acid-alkali resistance and enhanced wear resistance. , Improve the effect of curing hardness
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specific Embodiment 1
[0022] This embodiment relates to an acid and alkali resistant wallpaper for laboratory use, including an acid and alkali resistant layer and a base layer. The acid and alkali resistant layer is formed by mixing the following raw materials: furan 11-15%, phenolic vinyl resin 36-40%, organic Silicon monomer resin 36-40%, catechol 1-5%, pyrogallic acid 1-5%, tris 1-5% and dopamine 1-5%, the base layer is made of non-woven fabric .
[0023] In the present invention, the acid and alkali resistant layer is formed by mixing the following raw materials: furan 11%, phenolic vinyl resin 40%, organic silicon monomer resin 40%, catechol 2%, pyrogallic acid 2%, trihydroxy Methylaminomethane 2.5% and Dopamine 2.5%.
[0024] In the present invention, the acid and alkali resistant layer is formed by mixing the following raw materials: furan 12%, phenolic vinyl resin 39%, organic silicon monomer resin 39%, catechol 2.5%, pyrogallic acid 2.5%, trihydroxy Methylaminomethane 2.5% and Dopamine ...
specific Embodiment 2
[0029] This embodiment relates to a preparation method of acid and alkali resistant wallpaper for laboratory use, comprising the following steps:
[0030] S1: Prepare raw materials in proportion.
[0031] S2: heat-melt phenolic vinyl resin and silicone monomer resin;
[0032] S3: Add furan, catechol, and pyrogallic acid to the colloid, and stir evenly;
[0033] S4: Immerse the colloid in a mixed aqueous solution of Tris and dopamine for 15 minutes and take it out;
[0034] S5: Pour the colloid hot melt into the mold again, and press the non-woven fabric on the colloid acid and alkali resistant layer;
[0035] S6: standing for cooling, polishing the acid and alkali resistant layer.
[0036] The present invention uses the mixture of phenolic vinyl resin and organosilicon monomer resin as the base material of the acid and alkali resistant layer, which has high acid and alkali resistance, and by using furan, the unsaturated bonds in the epoxy vinyl resin and the organosilicon r...
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