Processing method of nanoimprint structure

Abstract

The invention relates to a processing method of a nanoimprint structure. The processing method comprises the following steps: A, coating a layer of special nanoimprint glue on the surface of a substrate; B, using a template with the target pattern size for conducting nanoimprinting on the special nanoimprinting glue, and copying and transferring the target pattern size to the substrate, obtaining a pattern mask, wherein an imprinting bottom film in the area is formed, not covered with the pattern mask, of the surface of the substrate; C, removing the impressing bottom film through a dry etching process, and forming an exposed area on the surface of the substrate; and D, transferring the target pattern size to the substrate. Through the arrangement, the problem that the target graph copying effect is poor or distorted due to the fact that the imprint bottom film in the chip structure prepared through the current nanoimprint technology influences the follow-up etching technology and also influences the follow-up stripping technology can be solved.

Description

technical field [0001] The invention relates to the technical field of nanoimprinting, in particular to a processing method of a nanoimprinting structure. Background technique [0002] With the continuous development and progress of micro-nano processing technology, nanoimprint technology has broken through the difficulties of traditional lithography in the process of reducing the feature size, and has the characteristics of high resolution, low cost and high yield. It is widely used in various fields involving micro-nano processing, such as semiconductor manufacturing, MEMS, and biochips. [0003] Nanoimprinting is different from traditional optical lithography. It uses both physical and UV light to replicate the structure. Usually, after the imprinting is completed, an imprinting base film of different thickness will be formed on the bottom of the structure (substrate surface), covering the substrate. [0004] That is, the mask structure prepared by nanoimprint technolog...

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Problems solved by technology

[0010] In order to solve the above-mentioned technical problems, the purpose of the present invention is to provide a processing method of nano-imprint structure to solve the problem that the imprinted base film in the chip structure prepared by the current nano-imprint technology not only affects the subsequent etching process, but also affects the subsequent stripping process. The resulting poor or distorted reproduction of target graphics

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