MASK FOR FORMING OLED PIXEL, MASK SUPPORT Template, AND FRAME-INTEGRATED MASK
A mask and pixel technology, applied in the field of frame-integrated masks, can solve the problems of poor products, too thin mask film, mask sagging, etc., and achieve the effect of precise size and position
Pending Publication Date: 2021-11-30
悟劳茂材料公司
View PDF0 Cites 0 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
In the process of fixing multiple masks to a frame, there is still the problem of poor alignment between masks and between mask units
In addition, in the process of welding and fixing the mask to the frame, the thickness of the mask film is too thin and the area is large, so there is a problem that the mask sags or twists due to the load
[0006] In this way, considering the pixel size of ultra-high-quality OLEDs, it is necessary to reduce the alignment error between each unit to about a few μm. Exceeding this error will lead to defective products, so the yield may be extremely low
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0057]For the detailed description of the present invention to be described later, reference is made to the accompanying drawings which are shown as specific embodiments in which the present invention can be practiced. In order to enable those skilled in the art to practice the present invention, the embodiments are specifically described below. These embodiments are described in sufficient detail to enable those skilled in the art to practice the invention. The various embodiments of the invention are to be understood as being different from each other but not mutually exclusive. For example, specific shapes, structures and characteristics described herein may enable one embodiment to be implemented into another embodiment without departing from the spirit and scope of the invention. In addition, it should be understood that the position or arrangement of individual constituent elements in each disclosed embodiment may be changed without departing from the spirit and scope o...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
| Property | Measurement | Unit |
|---|---|---|
| width | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
| size | aaaaa | aaaaa |
Login to View More
Abstract
The invention relates to a mask for OLED pixel formation, a mask support template, and a frame-integrated mask. The mask according to the present invention is a mask for forming OLED pixels on which a plurality of mask patterns are formed. The mask patterns comprise a first mask pattern on the upper portion and a second mask pattern on the lower portion, the thickness of the first mask pattern being greater than the thickness of the second mask pattern, both side surfaces of the first mask pattern having a concave curvature, and the thickness of the second mask pattern being greater than the thickness of the first mask pattern. The upper width of the first mask pattern is larger than the lower width of the second mask pattern, and the lower width of the first mask pattern is smaller than the lower width of the second mask pattern.
Description
technical field [0001] The present invention relates to a mask for forming OLED pixels, a mask supporting template, and a frame-integrated mask. More specifically, it relates to a mask for forming an OLED pixel, a mask supporting template, and a frame-integrated mask capable of accurately controlling the size and position of a mask pattern. Background technique [0002] As a technique for forming pixels in the OLED (Organic Light Emitting Diode) manufacturing process, the FMM (Fine Metal Mask) method is mainly used, which sticks a metal mask (Shadow Mask) in the form of a thin film to the substrate And deposit organic matter on the desired position. [0003] A conventional mask manufacturing method prepares a thin metal plate used as a mask, performs PR coating on the metal thin plate, and then performs patterning or performs PR coating to have a pattern and then etches to manufacture a patterned mask. However, in order to prevent the shadow effect (Shadow Effect), it is d...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More Patent Type & Authority Applications(China)
IPC IPC(8): H01L51/56H01L51/00H01L27/32
CPCH10K71/10H10K59/12H10K71/00C23C14/042H10K71/166
Inventor 李炳一金奉辰
Owner 悟劳茂材料公司