Precise movement air floatation supporting device

Abstract

The invention relates to the technical field of precise movement, and discloses a precise movement air floatation supporting device which comprises a base, a guide rail and a supporting frame, wherein the guide rail is horizontally arranged on the base and fixedly connected with the base, the supporting frame is arranged on the guide rail in a sleeving mode and can slide along the guide rail, and the supporting frame comprises a bottom air floatation plate, a top air floatation plate and lateral air floatation plates; the number of the lateral air floating plates is two, the two lateral air floating plates are symmetrically arranged, lateral air paths are arranged in the lateral air floating plates, lateral air inlet holes and lateral exhaust holes which are communicated with the lateral air paths are formed in the surfaces of the lateral air floating plates, and a bottom surface air path is arranged in the bottom air floating plate. And the surface of the bottom air floating plate is provided with a bottom surface air inlet hole and a bottom surface air outlet hole which are communicated with the bottom surface air path. Compared with the prior art, the precise movement air floatation supporting device is simple and reliable in structural design, the air inlet and outlet holes and the air path design can effectively reduce the space occupation amount of an air source, the supporting frame has good movement posture and movement precision, and the use experience of operators is good.

Description

technical field [0001] The invention relates to the technical field of precision motion, in particular to an air bearing support device for precision motion. Background technique [0002] As a core component of the semiconductor processing industry, lithography machines are important equipment for high-end electronic chip manufacturing. With the continuous breakthrough of Moore's law of the number of transistors in a chip per unit area, the traditional low-speed, low-precision ordinary lithography machine has been difficult to meet the market demand. It must have the motion conditions of high precision, high speed and high acceleration. At the same time, the lithography machine is a highly integrated product of the semiconductor etching process. The stroke of each moving part in the whole machine has strict requirements, and the space layout must be reasonable and compact. [0003] Existing lithography machines include a light source, an optical path system, a mask stage, ...

AI Technical Summary

Problems solved by technology

[0004] The air-floating supporting frame structure of the micro-moving table of the existing lithography machine is of high quality, the air-floating system is complex and the space occupation rate is high, which cannot meet the high-speed and high-precision movement requirements of the micro-moving table of the lithography machine, which seriously limits the precision of the chip manufacturing process further improvement of

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