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Hot filament chemical vapor deposition equipment

A technology of vapor phase deposition and hot wire chemistry, applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problems affecting the stability of the temperature field of the equipment, so as to ensure stability, meet heat dissipation requirements, and avoid overheating effect

Pending Publication Date: 2022-01-21
GUANGDONG UCAN ROBOT TECH CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a hot wire chemical vapor deposition equipment to solve the problem in the prior art that the intricate waterways affect the stability of the temperature field in the equipment

Method used

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  • Hot filament chemical vapor deposition equipment
  • Hot filament chemical vapor deposition equipment
  • Hot filament chemical vapor deposition equipment

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Embodiment Construction

[0046]In order to make the purpose, features and advantages of the present invention more obvious and understandable, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the following The described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0047] In the description of the present invention, it should be understood that the orientations or positional relationships indicated by the terms "upper", "lower", "top", "bottom", "inner" and "outer" are based on those shown in the accompanying drawings. Orientation or positional relationship is only for the convenience of describing t...

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Abstract

The invention discloses hot wire chemical vapor deposition equipment. When a workpiece is plated with a coating, the workpiece is placed on a workpiece placing disc, the workpiece placing disc is supported and cooled through a first supporting piece, and overheating of a cooling base due to heat generated by a hot filament is avoided; and a hot filament clamping device is loaded on second supporting pieces through heat conduction pieces, cooling water in second cooling water flow channels in the second supporting pieces indirectly cools the hot filament clamping device through the heat conduction pieces, the length of the second cooling water flow channels extending into a reaction cavity is reduced, and the heat dissipation requirement of the hot filament clamping device is met. According to the hot filament chemical vapor deposition equipment, the heat dissipation capacity of the combination of the second supporting pieces and the heat conduction pieces is smaller than that of the combination of the first supporting piece and the cooling base, the heat dissipation requirements of different parts of the hot filament chemical vapor deposition equipment are met, meanwhile, too many water paths are not introduced, the influence of the water paths on a temperature field in the transportation process is avoided, and the stability of the product is ensured.

Description

technical field [0001] The invention relates to the technical field of hot wire chemical vapor deposition, in particular to a hot wire chemical vapor deposition equipment. Background technique [0002] Hot filament chemical vapor deposition (Hot filament Chemical Vapor Deposition, HFCVD) is an important method for artificially synthesizing diamond films. It has the advantages of mature technology, simple equipment, convenient operation, low preparation cost, high deposition rate, and large deposition area. It is very suitable for It is used in large-scale industrial production. In recent years, a series of mechanical processing tools and wear-resistant devices such as diamond-coated tools, drawing dies, and mechanical seals prepared by this method have been widely used in the industry. Among them, the hot wire chemical vapor deposition method usually uses hydrogen and methane as the gas source gas, and mixes them according to a certain ratio into a reaction chamber that has ...

Claims

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Application Information

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IPC IPC(8): C23C16/27C23C16/44C23C16/46
CPCC23C16/271C23C16/44C23C16/463
Inventor 王俊锋袁明
Owner GUANGDONG UCAN ROBOT TECH CO LTD